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<title><![CDATA[EC21 Product Catalogs - rotary sputtering targets]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/rotary_sputtering_targets--2617/1/rotary sputtering targets.html]]></link><item>
<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[sputtering targets can work independently or at the same time 
The 
5. substrate &amp;le;60mm in diameter, can be heated to &amp;le;700℃, with water cooling, substrate speed adjustable, adjustable target b]]></description><pubDate><![CDATA[20170614]]></pubDate></item>

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