<?xml version="1.0" encoding="utf-8" ?>
<rss version="2.0">
<channel>
<title><![CDATA[EC21 Product Catalogs - sputtering units]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/sputtering_units--2617/1/sputtering units.html]]></link><item>
<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[unit 
3. continuous pumping for 30 minutes, the vacuum degree is less than or equal to 8x10&amp;sup3;Pa 
4. cylindrical sputtering targets can work independently or at the same time 
The 
5. substrate &amp;l]]></description><pubDate><![CDATA[20170614]]></pubDate></item>

</channel>
</rss>