<?xml version="1.0" encoding="utf-8" ?>
<rss version="2.0">
<channel>
<title><![CDATA[EC21 Product Catalogs - Magnetron Sputtering]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/Magnetron Sputtering.html]]></link><item>
<title><![CDATA[SIMVACO Horizontal PVD Coating Production Line Metal &amp; Glass Substrate Magnetron Sputtering Machine]]></title><link><![CDATA[https://simvaco.en.ec21.com/SIMVACO_Horizontal_PVD_Coating_Production--12034890_12036327.html]]></link><description><![CDATA[sputtering techniques, this production line ensures ultra-thin and uniform coating layers, ideal for applications requiring optical clarity or electrical conductivity.
Customizable Layering Capabilit]]></description><pubDate><![CDATA[20250112]]></pubDate></item>
<item>
<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG_Medium_Frequency_Magnetron_Sputtering--11960615_11986065.html]]></link><description><![CDATA[The magnetron multi arc sputtering coating machine generates glow discharge between the anode and cathode in a vacuum state, and gas molecules between the electrodes are ionized to generate charged c]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
<item>
<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab_Equipment_Setcas_Magnetron_Sputtering--11981229_11981246.html]]></link><description><![CDATA[Parameters： 1. Size of quartz chamber: 150X120MM2. Sample size: 70mm3. Sputtering size: 50mm4. Maximum vacuum: 5pa5. Gas usable: Inert gases such as hydrogen, nitrogen, etc.6. Maximum sputtering sp]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
<item>
<title><![CDATA[Multi-arc Magnetron Sputtering Composite Coating Equipment]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi_arc_Magnetron_Sputtering_Composite--11979832_11979839.html]]></link><description><![CDATA[Magnetron sputtering metallizer is mainly used for decorative and functional reaction films, which has the advantages of high deposition rate and fast reaction speed, and completely overcomes the phe]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
<item>
<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[magnetron sputtering 
target interface, 
a high vacuum valve interface, a drainage pipe interface, an 
observation window interface, 
three valve interface, three interface and operating mechanism of]]></description><pubDate><![CDATA[20170614]]></pubDate></item>
<item>
<title><![CDATA[Factory Direct Target Material Rotary Si Silicon Magnetron Cylindrical Sputtering Target]]></title><link><![CDATA[https://dan4613.en.ec21.com/Factory_Direct_Target_Material_Rotary--1695427_11359018.html]]></link><description><![CDATA[Magnetron Sputtering Targets and Rare materials .We are leading technology company in Sputtering Targets ,and Portble Solar resources .Our targets are used on Low E glass, solar panel Tco glass, touc]]></description><pubDate><![CDATA[20211106]]></pubDate></item>
<item>
<title><![CDATA[Ref-dark Grey Glass]]></title><link><![CDATA[https://tuoyuan.en.ec21.com/Ref_dark_Grey_Glass--10878771_11207026.html]]></link><description><![CDATA[Reflective glass (coated
glass),also known as heat
reflective glass (solar control coated glass), it uses vacuum magnetron
sputtering method to electroplating ws0ay on the surface of high-quality flo]]></description><pubDate><![CDATA[20240715]]></pubDate></item>
<item>
<title><![CDATA[Dark Grey Glass]]></title><link><![CDATA[https://amy231225.en.ec21.com/Dark_Grey_Glass--11924854_11924919.html]]></link><description><![CDATA[Reflective glass (coated glass),also known as heat reflective glass (solar control coated glass), it uses vacuum magnetron sputtering method to electroplating ws0ay on the surface of high-quality flo]]></description><pubDate><![CDATA[20240711]]></pubDate></item>
<item>
<title><![CDATA[Monocrystalline Silicon Wafer]]></title><link><![CDATA[https://czboyan.en.ec21.com/Monocrystalline_Silicon_Wafer--11964559_11964560.html]]></link><description><![CDATA[magnetron sputtering growth sample, XRD, SEM, Atomic force, infrared spectroscopy, fluorescence spectroscopy and other analysis test substrates, molecular beam epitaxial growth substrates, X-ray anal]]></description><pubDate><![CDATA[20240707]]></pubDate></item>
<item>
<title><![CDATA[Perkin-Elmer 4400 Sputter Deposition Equipment]]></title><link><![CDATA[https://allwin21.en.ec21.com/Perkin_Elmer_4400_Sputter_Deposition--9763374_9763385.html]]></link><description><![CDATA[Sputter AW4450 SputterbySputter Deposition EquipmentAccuSputter AW 4450 Sputter: Manual, with Load Lock,RF/DC; Diode/Magnetron, Wafer Size: Small~8 inch. New Condition. ~3xDelta Shape OR ~4xCircle Sh]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
<item>
<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium_Sputtering_Target--11858526_11931203.html]]></link><description><![CDATA[Sputtering Target composition.
Variety of Products: In addition to our Niobium Sputtering Targets, we offer a wide range of other magnetron sputtering targets, evaporation sources, and deposition mat]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
<item>
<title><![CDATA[Non Pressure Solar Water Heater]]></title><link><![CDATA[https://xinyidasolar2023.en.ec21.com/Non_Pressure_Solar_Water_Heater--11774694_11774695.html]]></link><description><![CDATA[tank: Galvanized color steel.
●Insulation: 50mm polyurethane foam for 72hrs heat preservation.
●Collector: Vacuum tube painted by magnetron sputtering selective.
●Bracket: Galvanized steel
]]></description><pubDate><![CDATA[20230423]]></pubDate></item>
<item>
<title><![CDATA[Pvd Coating]]></title><link><![CDATA[https://richconncnc.en.ec21.com/Pvd_Coating--11781758_11781777.html]]></link><description><![CDATA[magnetron sputtering to name a few. HEF specializes in plasma enhanced magnetron sputtering, CAM (coating assisted by microwaves) and modified arc evaporation coating technologies. PVD coating techno]]></description><pubDate><![CDATA[20230504]]></pubDate></item>
<item>
<title><![CDATA[Copper Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Copper_Target--11825682_11825684.html]]></link><description><![CDATA[sputtering techniques, such as two-pole sputtering, three-pole sputtering, four-pole sputtering, RF sputtering, ion beam sputtering, magnetron sputtering, and facing targets sputtering. It is suitabl]]></description><pubDate><![CDATA[20230727]]></pubDate></item>
<item>
<title><![CDATA[99.999% Tungsten Target]]></title><link><![CDATA[https://linaqin.en.ec21.com/99.999_Tungsten_Target--2999626_7846403.html]]></link><description><![CDATA[Appearance: silvery metal.
Common uses:magnetron sputtering targets for semiconductor field and other high-tech fields.
Density: density&amp;ge;19.2g/cm&amp;sup3;
Size: available for customers&amp;rsquo;requests]]></description><pubDate><![CDATA[20171026]]></pubDate></item>
<item>
<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium_Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>

</channel>
</rss>