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<title><![CDATA[EC21 Product Catalogs - magnetron sputter]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/magnetron-sputter--2673/1/magnetron sputter.html]]></link><item>
<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab-Equipment-Setcas-Magnetron-Sputtering--11981229_11981246.html]]></link><description><![CDATA[Parameters： 1. Size of quartz chamber: 150X120MM2. Sample size: 70mm3. Sputtering size: 50mm4. Maximum vacuum: 5pa5. Gas usable: Inert gases such as hydrogen, nitrogen, etc.6. Maximum sputtering sp]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
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<title><![CDATA[AccuSputter AW 4450 Sputter Deposition System]]></title><link><![CDATA[https://allwin21.en.ec21.com/AccuSputter-AW-4450-Sputter-Deposition--9763374_9763384.html]]></link><description><![CDATA[Sputter Methods: RF (RG VII: Air cooling 300W, 600W, 1000W, 2000W, 3000W)/ DC(Advanced Energy PNC3 6K , PNC3 10K)/ Pulsed DC (Advanced Energy PNC3 PLUS+ 5K, PNC3 PLUS+ 10K); Diode/MagnetronGas Lines:]]></description><pubDate><![CDATA[20240514]]></pubDate></item>

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