<?xml version="1.0" encoding="utf-8" ?>
<rss version="2.0">
<channel>
<title><![CDATA[EC21 Product Catalogs - cathodes]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/cathodes--2673/1/cathodes.html]]></link><item>
<title><![CDATA[Plasma Gas Combustion Cathode]]></title><link><![CDATA[https://reframetals.en.ec21.com/Plasma_Gas_Combustion_Cathode--12016380_12041522.html]]></link><description><![CDATA[cathode choice for plasma gas combustion technology. It plays an irreplaceable role in ensuring optimal combustion performance, enhancing equipment compatibility, and improving overall efficiency.
]]></description><pubDate><![CDATA[20250206]]></pubDate></item>
<item>
<title><![CDATA[Electrode-posited Copper Foil Titanium Cathode Drum]]></title><link><![CDATA[https://rlesfys6870.en.ec21.com/Electrode_posited_Copper_Foil_Titanium--11936846_11936855.html]]></link><description><![CDATA[The titanium drum is a cathode used in the production of electrolytic copper foil which is suitable for Lithium Ion Battery, copper clad laminate(CCL), printed-circuit board(PCB), 5G communication, S]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
<item>
<title><![CDATA[Electrocleaning for Brush Plating, Electrocleanor for Selective Plating]]></title><link><![CDATA[https://creview.en.ec21.com/Electrocleaning_for_Brush_Plating_Electrocleanor--12015860_12055575.html]]></link><description><![CDATA[Technical Data Sheet
ELECTROCLEANING
Solution
Electrocleaning
Code No.
CJ1-001
Amp Hour Factor
N/A
Voltage Range
6V-14V
Anode /Cathode Movement
10-30m/min
Max Current Density
N/A
Average Current Dens]]></description><pubDate><![CDATA[20260415]]></pubDate></item>
<item>
<title><![CDATA[PP Stirred Tank Chemical Liquid Reactor Stirred Tank]]></title><link><![CDATA[https://hairui05299.en.ec21.com/PP_Stirred_Tank_Chemical_Liquid--11996706_11996883.html]]></link><description><![CDATA[cathode moving plating tank is composed of tank body, conductive device, steam heating tube and cathode moving device of steel groove lining soft PVC plastic. The choice of the tank structure depends]]></description><pubDate><![CDATA[20240902]]></pubDate></item>
<item>
<title><![CDATA[Hardware Spraying Production Line]]></title><link><![CDATA[https://hengjiujinye.en.ec21.com/Hardware_Spraying_Production_Line--11982428_11982454.html]]></link><description><![CDATA[cathodic electrophoresis coating line. The advantage of electrostatic powder coating is that the coating has good uniformity and corrosion resistance, but it requires specialized power facilities for]]></description><pubDate><![CDATA[20240808]]></pubDate></item>
<item>
<title><![CDATA[Barrel Electroplating Equipment for Zinc Copper Nickel]]></title><link><![CDATA[https://ruisite.en.ec21.com/Barrel_Electroplating_Equipment_for_Zinc--11829659_11979189.html]]></link><description><![CDATA[cathode conductive device (copper wire or copper rod) is naturally connected to the workpiece inside the drum by its own weight.
• The structure, size, rotation speed, conductivity and aperture rat]]></description><pubDate><![CDATA[20240802]]></pubDate></item>
<item>
<title><![CDATA[AccuSputter AW 4450 Sputter Deposition System]]></title><link><![CDATA[https://allwin21.en.ec21.com/AccuSputter_AW_4450_Sputter_Deposition--9763374_9763384.html]]></link><description><![CDATA[Cathodes: 1~3 x Delta Shape OR 1~4 x 8″ Circle ShapeSputter Methods: RF (RG VII: Air cooling 300W, 600W, 1000W, 2000W, 3000W)/ DC(Advanced Energy PNC3 6K , PNC3 10K)/ Pulsed DC (Advanced Energy PNC]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
<item>
<title><![CDATA[Magnetic Filter]]></title><link><![CDATA[https://52556019.en.ec21.com/Magnetic_Filter--1955587_1955588.html]]></link><description><![CDATA[Magnetic Filter part Has many strong magnets to magnetize water by helix state. The part Forces +/- hydronium temporarily into cathode to exchange water molecule and mineral hydronium,makes Ca2+/Mg2+]]></description><pubDate><![CDATA[20100526]]></pubDate></item>
<item>
<title><![CDATA[Cold Briquetting Machine]]></title><link><![CDATA[https://posjeil.en.ec21.com/Cold_Briquetting_Machine--11211743_11211860.html]]></link><description><![CDATA[Cathode material
• Ferro molybdenum
• Carbon dust
• Oxide fine
• Steelmaking dust
• Etc
[Specifications for Design]
• Production Capacity : 50 kg/hr~70 ton/hr
• Design Temperature : -40]]></description><pubDate><![CDATA[20230228]]></pubDate></item>
<item>
<title><![CDATA[Copper Rod Continuous Casting and Rolling Line]]></title><link><![CDATA[https://linttop005.en.ec21.com/Copper_Rod_Continuous_Casting_and--9386729_9386730.html]]></link><description><![CDATA[cathode or 100% scrap copper
Furnace
cathode: vertical melting furnace+holding furnace
100% scrap copper: reverberatory furnace
Productivity
5-15T/h
Casting bar
1400-2300mm2
Coil&amp;#39;s weight
3000~50]]></description><pubDate><![CDATA[20150211]]></pubDate></item>
<item>
<title><![CDATA[CNC Machining Copper]]></title><link><![CDATA[https://flourishlegend.en.ec21.com/CNC_Machining_Copper--11858161_11858170.html]]></link><description><![CDATA[cathode copper, which refers to copper refined through electrolysis. Typically, this process involves filling copper compounds into a solution. Then, applying sufficient power helps in purifying the ]]></description><pubDate><![CDATA[20231024]]></pubDate></item>
<item>
<title><![CDATA[Electrophoresis (KTL)]]></title><link><![CDATA[https://sibai.en.ec21.com/Electrophoresis_KTL--11765414_11833592.html]]></link><description><![CDATA[Electrophoresis (cathodic dip coating), another German name KTL-Beschichtung (Kathodische Tauchlackierung) is a widely used surface treatment process. It mainly plays the role of substrate anti-corro]]></description><pubDate><![CDATA[20230814]]></pubDate></item>
<item>
<title><![CDATA[100ml/Min PEM Hydrogen Cell Electrolyzer Stack Pure H2 Output]]></title><link><![CDATA[https://smtlabtech.en.ec21.com/100ml_Min_PEM_Hydrogen_Cell--11702388_11702392.html]]></link><description><![CDATA[cathode to absorb electron to form hydrogen gas.
Technical Parameters of PEM hydrogen cell
1. hydrogen flow:100ml/min
2. oxygen flow: 50ml/min
ModelMax H2 flow rateMax O2 flow rateStack sizeC100100ml]]></description><pubDate><![CDATA[20230104]]></pubDate></item>

</channel>
</rss>