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<title><![CDATA[EC21 Product Catalogs - dry etch]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/dry_etch--2673/1/dry etch.html]]></link><item>
<title><![CDATA[Radio-Frequency Plasma System AS-V100]]></title><link><![CDATA[https://atvplasma.en.ec21.com/Radio_Frequency_Plasma_System_AS--11960396_11960409.html]]></link><description><![CDATA[etch-back, as well as contaminant removal, after laser drilling of vias.
2.Removal of carbides generated by laser blind hole drilling.
3.Removal of dry film residues during fine line creation.
4.Surf]]></description><pubDate><![CDATA[20240701]]></pubDate></item>
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<title><![CDATA[AW-2001R Microwave Plasma Etcher]]></title><link><![CDATA[https://allwin21.en.ec21.com/AW_2001R_Microwave_Plasma_Etcher--9763389_9763393.html]]></link><description><![CDATA[EtchVideo on AccuSputter AW4450 Sputter Deposition EquipmentVideo on Upgrade Kit for Lam AutoEtch 490, Lam AutoEtch 590, Lam AutoEtch 690, Lam AutoEtch 790
Plasma Etcher, Please Etching, Dry Etching,]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
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<title><![CDATA[Semiconductor Scrubber]]></title><link><![CDATA[https://bdc77.en.ec21.com/Semiconductor_Scrubber--11837922_11837924.html]]></link><description><![CDATA[Dry etch
NF3 3.0 slm &gt; 95% at 300slm inlet flow for CVD
MTBF / MTTR
&gt; 6 months / 1.5hr for full maintenance
CDA
Adjustable 3~10 SLM
PCW
Adjustable 10~15 SLM
N2
Adjustable 20~100 SLM
Intel Numbers
NW5]]></description><pubDate><![CDATA[20231231]]></pubDate></item>
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<title><![CDATA[Wet Metal Chemical Etching Machine and PCB Etching Machine]]></title><link><![CDATA[https://wetetching.en.ec21.com/Wet_Metal_Chemical_Etching_Machine--11869945_11869948.html]]></link><description><![CDATA[etching machine:Acid Controller – Popular for cupric chloride etchantDrying – Ensures products come out of the line dry.Inline Filtration – Results in fewer clogged nozzles and particles in sol]]></description><pubDate><![CDATA[20231124]]></pubDate></item>

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