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<title><![CDATA[EC21 Product Catalogs - heatpulse]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/heatpulse--2673/1/heatpulse.html]]></link><item>
<title><![CDATA[AccuThermo AW 820 Rapid Thermal Annealer]]></title><link><![CDATA[https://allwin21.en.ec21.com/AccuThermo_AW_820_Rapid_Thermal--9759759_9763383.html]]></link><description><![CDATA[Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and rely on a pre-process nitrogen or argon purge prior to wafer processing. They are still being ]]></description><pubDate><![CDATA[20240514]]></pubDate></item>

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