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<title><![CDATA[EC21 Product Catalogs - plasma surface modification]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/plasma_surface_modification--2673/1/plasma surface modification.html]]></link><item>
<title><![CDATA[9MB Electrode for Semiconductor Coating]]></title><link><![CDATA[https://reframetals.en.ec21.com/9MB_Electrode_for_Semiconductor_Coating--12016380_12041517.html]]></link><description><![CDATA[plasma spraying, the 9MB electrode can quickly convert electrical energy into heat, causing the sprayed material to rapidly melt and be evenly applied to the semiconductor wafer surface. This efficie]]></description><pubDate><![CDATA[20250206]]></pubDate></item>
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<title><![CDATA[Atmospheric Plasma Cleaning System Chain Conveyor]]></title><link><![CDATA[https://atvplasma.en.ec21.com/Atmospheric_Plasma_Cleaning_System_Chain--11960396_11963494.html]]></link><description><![CDATA[surface activity of the material.
Advantages of low-temperature plasma cleaning
Plasma cleaning, as an important material surface modification method, has been widely used in many fields.
Compared wi]]></description><pubDate><![CDATA[20240705]]></pubDate></item>

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