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<title><![CDATA[EC21 Product Catalogs - rta system]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/rta_system--2673/1/rta system.html]]></link><item>
<title><![CDATA[AccuThermo AW 820 Rapid Thermal Annealer]]></title><link><![CDATA[https://allwin21.en.ec21.com/AccuThermo_AW_820_Rapid_Thermal--9759759_9763383.html]]></link><description><![CDATA[systems. It was founded in 1981 and produced the first single wafer RTP system in 1982, the Heatpulse 210. In 1987, it produced the Heatpulse 610. These RTP systems run at atmospheric pressure and re]]></description><pubDate><![CDATA[20240514]]></pubDate></item>

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