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<title><![CDATA[EC21 Product Catalogs - sputtering]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/sputtering--054299/1/sputtering.html]]></link><item>
<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar_Alloy_Sputtering_Target--11928897_11928898.html]]></link><description><![CDATA[Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ens]]></description><pubDate><![CDATA[20240605]]></pubDate></item>

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