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<title><![CDATA[EC21 Product Catalogs - sputter]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/sputter--100305/1/sputter.html]]></link><item>
<title><![CDATA[OEM Monocrystalline Silicon Target, Silicon Blocks,Si Parts, Silicon Sputtering Target]]></title><link><![CDATA[https://huanaifei.en.ec21.com/OEM-Monocrystalline-Silicon-Target--11859710_11859732.html]]></link><description><![CDATA[Silicon targets can generally be divided into two types: single crystal and polycrystalline.
The company uses Czochralski crystal growth technology and directional solidification growth technology to]]></description><pubDate><![CDATA[20241103]]></pubDate></item>
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<title><![CDATA[6N Copper and Copper Alloy Sputtering Target]]></title><link><![CDATA[https://cowinsemicon.en.ec21.com/6N-Copper-and-Copper-Alloy--11927707_11927708.html]]></link><description><![CDATA[sputtered into conductive layer on the wafer by using PVD process. Our products with IPAS technology is effectively improving the film quality, sputtering rate and yield of wafers. Materials lifetime]]></description><pubDate><![CDATA[20240422]]></pubDate></item>
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<title><![CDATA[Monocrystalline Silicon Wafer]]></title><link><![CDATA[https://czboyan.en.ec21.com/Monocrystalline-Silicon-Wafer--11964559_11964560.html]]></link><description><![CDATA[sputtering growth sample, XRD, SEM, Atomic force, infrared spectroscopy, fluorescence spectroscopy and other analysis test substrates, molecular beam epitaxial growth substrates, X-ray analysis of cr]]></description><pubDate><![CDATA[20240707]]></pubDate></item>

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