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<title><![CDATA[EC21 Product Catalogs - rf plasmas]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/rf_plasmas--2349/1/rf plasmas.html]]></link><item>
<title><![CDATA[Copper Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Copper_Target--11825682_11825684.html]]></link><description><![CDATA[plasma that is accelerated towards the target surface. The plasma ionizes the gaseous argon, creating high-energy ions that impact the copper target, causing sputtering. The sputtered material is dep]]></description><pubDate><![CDATA[20230727]]></pubDate></item>

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