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<title><![CDATA[EC21 Product Catalogs - Sputtering Targets]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/Sputtering Targets.html]]></link><item>
<title><![CDATA[OEM Monocrystalline Silicon Target, Silicon Blocks,Si Parts, Silicon Sputtering Target]]></title><link><![CDATA[https://huanaifei.en.ec21.com/OEM_Monocrystalline_Silicon_Target_Silicon--11859710_11859732.html]]></link><description><![CDATA[Silicon targets can generally be divided into two types: single crystal and polycrystalline.
The company uses Czochralski crystal growth technology and directional solidification growth technology to]]></description><pubDate><![CDATA[20241103]]></pubDate></item>
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<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab_Equipment_Setcas_Magnetron_Sputtering--11981229_11981246.html]]></link><description><![CDATA[hydrogen, nitrogen, etc.6. Maximum sputtering speed: 8nm/min7. Power: 200W8. Dimension: 360(W)X310(D)X150mm(H)9. With pumps and 1 target(Please contact me if you need the target for other materials)]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
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<title><![CDATA[NiCr Alloy Nickel Chromium Alloy Target NiCr Sputtering Target for Pvd Coating]]></title><link><![CDATA[https://xinkang8888.en.ec21.com/NiCr_Alloy_Nickel_Chromium_Alloy--11706866_11980521.html]]></link><description><![CDATA[OEM Nickel chromium alloy Rotary Target NiCr Alloy Pipe NiCr10 NiCr20 NiCr30 Nickel Chromium Alloy Targets for Vapor deposited thin filmPurity99.99%-99.999%Size0.1mm, 0.2mm,0.5mm Other OEM sizeApplic]]></description><pubDate><![CDATA[20240805]]></pubDate></item>
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<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar_Alloy_Sputtering_Target--11928897_11928898.html]]></link><description><![CDATA[sputtering targets
play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industr]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium_Sputtering_Target--11858526_11931203.html]]></link><description><![CDATA[sputtering targets.
Features of niobium sputtering target
Exceptional Purity: The niobium sputtering targets from CS Titanium boast exceptional purity, ensuring minimal contamination and the producti]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[6N Copper and Copper Alloy Sputtering Target]]></title><link><![CDATA[https://cowinsemicon.en.ec21.com/6N_Copper_and_Copper_Alloy--11927707_11927708.html]]></link><description><![CDATA[targets is sputtered into conductive layer on the wafer by using PVD process. Our products with IPAS technology is effectively improving the film quality, sputtering rate and yield of wafers. Materia]]></description><pubDate><![CDATA[20240422]]></pubDate></item>
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<title><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)]]></title><link><![CDATA[https://hvm12.en.ec21.com/Sputtering_Target_Copper_Nickel_Ni7V--11499079_11547965.html]]></link><description><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)
________________________________________________
Copper Sputtering Target
Copper Sputtering Target 
L 426.5 mm * W 132mm * T 8mm
_____________________________]]></description><pubDate><![CDATA[20220330]]></pubDate></item>
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<title><![CDATA[China Products/Suppliers. Supply High Purity B4c Sputtering Target/99.5% Boron Carbide Target with B]]></title><link><![CDATA[https://susan607.en.ec21.com/China_Products_Suppliers._Supply_High--11866308_11866369.html]]></link><description><![CDATA[其特点是密度低、强度高、高温稳定性好、化学稳定性好。在耐磨材料中，陶瓷增强，特别是在轻装甲、反应堆中子吸收剂应用中。另外，与金刚石和]]></description><pubDate><![CDATA[20231114]]></pubDate></item>
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<title><![CDATA[Ultrasonic Sputtering Target Bonding Machine]]></title><link><![CDATA[https://mecstech.en.ec21.com/Ultrasonic_Sputtering_Target_Bonding_Machine--719392_4374124.html]]></link><description><![CDATA[It is widely used for coating indium on the various kinds of sputtering target. 
]]></description><pubDate><![CDATA[20140619]]></pubDate></item>
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<title><![CDATA[99.99% High Purity Indium Tin Oxide Rotating ITO Ceramic Sputtering ITO  Target]]></title><link><![CDATA[https://dan4613.en.ec21.com/99.99_High_Purity_Indium_Tin--1695427_11359065.html]]></link><description><![CDATA[Sputtering
Targets , we has
ITO,SI, TIOX, NBOX, AZO, SIAL, ZNAL , match with PVD coating system such as Von
Ardenne, Boc, Airco,Amat, Leybold and other customized coating systems.
Ningbo Sen Ao Elect]]></description><pubDate><![CDATA[20211106]]></pubDate></item>
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<title><![CDATA[Tantalum Sputtering Target]]></title><link><![CDATA[https://bjlhjs2012.en.ec21.com/Tantalum_Sputtering_Target--7387516_9904315.html]]></link><description><![CDATA[Tantalum sputtering target Tantalum- tungsten Alloy target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
recta]]></description><pubDate><![CDATA[20220809]]></pubDate></item>
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<title><![CDATA[Metal Sputtering Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Metal_Sputtering_Target--11825682_11857776.html]]></link><description><![CDATA[Metal pt sputtering target and au sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These]]></description><pubDate><![CDATA[20231023]]></pubDate></item>
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<title><![CDATA[Yttrium Nitride Powder/Pellet]]></title><link><![CDATA[https://ledphor.en.ec21.com/Yttrium_Nitride_Powder_Pellet--10285650_10583348.html]]></link><description><![CDATA[Size
3-5um/8-15um/1-2mm/customized
Main Applications
Used in high-end electronics, sputtering target, fluorescent powder, ceramic materials, magnetic materials, semiconductor materials, coating.
]]></description><pubDate><![CDATA[20250401]]></pubDate></item>
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<title><![CDATA[High Purity Chromium Metal]]></title><link><![CDATA[https://jztyxc.en.ec21.com/High_Purity_Chromium_Metal--12051228_12051236.html]]></link><description><![CDATA[Scenarios: 
✓ High-temperature alloy additives for aircraft engines
✓ Base materials for semiconductor sputtering targets
✓ Corrosion-resistant materials for nuclear industry components
]]></description><pubDate><![CDATA[20250322]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://finleycheung.en.ec21.com/Molybdenum_Sheet--12047319_12047323.html]]></link><description><![CDATA[sputtering target, and sapphire growth furnace components.
Our molybdenum sheets are available in thickness ranging from 0.25 mm to 4.75 mm, with a purity range of 99.9% to 99.95%. We also offer a va]]></description><pubDate><![CDATA[20250307]]></pubDate></item>
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<title><![CDATA[TiOx NbOx Cr2O3 Al2O3 YSZ Y2O3/YOF/YF3/YAG for Plasma Spray Coating]]></title><link><![CDATA[https://crownre2008.en.ec21.com/TiOx_NbOx_Cr2O3_Al2O3_YSZ--11957443_11985958.html]]></link><description><![CDATA[field;
2. Rotatable sputtering target materials, Cylindrical sputtering target materials, Flat target materials, Conductive ceramic diaphragm etc.
CrownRe Innovative Materials Corp. ]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG_Medium_Frequency_Magnetron_Sputtering--11960615_11986065.html]]></link><description><![CDATA[target material on the cathode, splashing out its atoms and other particles. The splashed atoms deposit on the anode substrate to form a thin film. This physical phenomenon is called sputtering, whic]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Multi-arc Magnetron Sputtering Composite Coating Equipment]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi_arc_Magnetron_Sputtering_Composite--11979832_11979839.html]]></link><description><![CDATA[target surface poisoning and abnormal glow discharge.
Metallizing single-layer films, multi-layer composite films, etc. on metal and non-metal substrates.
The updated cathode sputtering target and po]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
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<title><![CDATA[Tungsten Cube]]></title><link><![CDATA[https://luoyangyoubo.en.ec21.com/Tungsten_Cube--11970868_11970869.html]]></link><description><![CDATA[sputtering target
Pure Tungsten Cube Feature:
1. High density;
2. Good machine ability;
3. Good mechanical properties;
4. High modulus of elasticity;
5. High absorption capacity against χ-rays and ]]></description><pubDate><![CDATA[20240718]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://mcwmo.en.ec21.com/Molybdenum_Plate--11837395_11962846.html]]></link><description><![CDATA[sputtering targets used in thin film deposition processes.High Temperature Furnaces:Production of molybdenum boats and molybdenum push plates used in high temperature furnaces.These components are ut]]></description><pubDate><![CDATA[20240704]]></pubDate></item>
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<title><![CDATA[Tungsten Plate]]></title><link><![CDATA[https://kktungstenmolybdenum.en.ec21.com/Tungsten_Plate--9967174_9967365.html]]></link><description><![CDATA[sputter target, crucible in electronic, vacuum furnace application.
W plate in Max size:
Thickness(mm)
Width(mm)
Length(mm)
1.5-2.0
150
200
2.0-3.0
200
250
3.0-4.0
250
600
4.0-6.0
300
600
6.0-8.0
300]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Upgrade Kits for Used Semiconductor Equipment]]></title><link><![CDATA[https://allwin21.en.ec21.com/Upgrade_Kits_for_Used_Semiconductor--9763376_9763390.html]]></link><description><![CDATA[sputter, since it is a little complicated, but we still target to upgrade within one week include training if the machine without other problems.
Upgraded Equipment Models :
Heatpulse 210
Heatpulse 4]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
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<title><![CDATA[Non Pressure Solar Water Heater]]></title><link><![CDATA[https://xinyidasolar2023.en.ec21.com/Non_Pressure_Solar_Water_Heater--11774694_11774695.html]]></link><description><![CDATA[tank: Galvanized color steel.
●Insulation: 50mm polyurethane foam for 72hrs heat preservation.
●Collector: Vacuum tube painted by magnetron sputtering selective.
●Bracket: Galvanized steel
]]></description><pubDate><![CDATA[20230423]]></pubDate></item>
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<title><![CDATA[Pvd Coating]]></title><link><![CDATA[https://richconncnc.en.ec21.com/Pvd_Coating--11781758_11781777.html]]></link><description><![CDATA[sputtering to name a few. HEF specializes in plasma enhanced magnetron sputtering, CAM (coating assisted by microwaves) and modified arc evaporation coating technologies. PVD coating technology is th]]></description><pubDate><![CDATA[20230504]]></pubDate></item>
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<title><![CDATA[Pure Mo Sheet for Vacuum Furnace&apos;s Chamber in China]]></title><link><![CDATA[https://cn04058551.en.ec21.com/Pure_Mo_Sheet_for_Vacuum--10370088_10844553.html]]></link><description><![CDATA[sputtering targets, crucibles in electronic and vacuum applications; 
2.Widely used for producing reflecting screen and cover inside sapphire crystal growth furnace, as well as reflecting screen, hea]]></description><pubDate><![CDATA[20181031]]></pubDate></item>
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<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[sputtering targets can work independently or at the same time 
The 
5. substrate &amp;le;60mm in diameter, can be heated to &amp;le;700℃, with water cooling, substrate speed adjustable, adjustable target b]]></description><pubDate><![CDATA[20170614]]></pubDate></item>
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<title><![CDATA[1250Mesh(10 Micron) Bi2Te3 Doped Selenium and Antimony N P Type Bismuth Telluride Powder]]></title><link><![CDATA[https://highpuritymetals.en.ec21.com/1250Mesh_10_Micron_Bi2Te3_Doped--11170695_11176214.html]]></link><description><![CDATA[Sputtering Targets,purity is 99.99%,Thermoelectric Cooler Peltiers are also available.
Bismuth Telluride Powder:gneral particle size is 200-1250mesh.Bismuth Telluride Pellets:gerneral size is 1.4x1.4]]></description><pubDate><![CDATA[20200617]]></pubDate></item>
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<title><![CDATA[99.999% Tungsten Target]]></title><link><![CDATA[https://linaqin.en.ec21.com/99.999_Tungsten_Target--2999626_7846403.html]]></link><description><![CDATA[Appearance: silvery metal.
Common uses:magnetron sputtering targets for semiconductor field and other high-tech fields.
Density: density&amp;ge;19.2g/cm&amp;sup3;
Size: available for customers&amp;rsquo;requests]]></description><pubDate><![CDATA[20171026]]></pubDate></item>
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<title><![CDATA[Chrome Target]]></title><link><![CDATA[https://kingchoice.en.ec21.com/Chrome_Target--1931314_1931551.html]]></link><description><![CDATA[Purity:2N5&amp;#65292;3N5 
Density:7.15g/cm3 
Specification:As Requested 
Processing Method:HIP]]></description><pubDate><![CDATA[20070618]]></pubDate></item>
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<title><![CDATA[High Purity Niobium Target]]></title><link><![CDATA[https://zhongbangtanb.en.ec21.com/High_Purity_Niobium_Target--7122904_7122971.html]]></link><description><![CDATA[Our company(Baoji Kedipu New Material Co.,LTD) is engaged in smelting, processing and selling rare metal materials. We supply all kinds products of tantalum, niobium, titanium, tungsten and molyvdenu]]></description><pubDate><![CDATA[20190617]]></pubDate></item>
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<title><![CDATA[Industry Nonferrous Materials Molybdenum Rings Round Circle Various Sizes]]></title><link><![CDATA[https://nonferrousmaterials.en.ec21.com/Industry_Nonferrous_Materials_Molybdenum_Rings--11853114_11853115.html]]></link><description><![CDATA[materials mold mold commonly use molybdenum.
Usage
Support wire, lead-in wire, printer needle, various electrodes and quartz furnaces, filament, high-speed tools, auto products,sputtering targets
]]></description><pubDate><![CDATA[20231011]]></pubDate></item>
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<title><![CDATA[Zinc Oxide Aluminum Target]]></title><link><![CDATA[https://chenfb2010.en.ec21.com/Zinc_Oxide_Aluminum_Target--5949956_5950161.html]]></link><description><![CDATA[Sputtering Targets Materials list: 
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy]]></description><pubDate><![CDATA[20140221]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://hsgmetal.en.ec21.com/Molybdenum_Sheet--11746113_11746123.html]]></link><description><![CDATA[sputtering target material, High temperature boat dishes and other products.
Production Process of Molybdenum Sheet
Molybdenum billet (raw material)- inspection - hot rolling - leveling and annealing]]></description><pubDate><![CDATA[20230313]]></pubDate></item>
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<title><![CDATA[Bismuth Telluride Rod]]></title><link><![CDATA[https://hillcater.en.ec21.com/Bismuth_Telluride_Rod--10932672_10932769.html]]></link><description><![CDATA[telluride rod use for semiconductor, electronic refrigeration and electricity generation. Bi2Te3 is evaporation coating material too, which can process into sputtering targets.]]></description><pubDate><![CDATA[20190402]]></pubDate></item>
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<title><![CDATA[MO1 99.95%min Polished Surface Molybdenum Target]]></title><link><![CDATA[https://bjsymetal.en.ec21.com/MO1_99.95_min_Polished_Surface--8359167_8651665.html]]></link><description><![CDATA[Molybdenum SputteringTarget 30mm&amp;times;500mm
1 Name: Molybdenum sputtering targets
2 Appearance: silver white metal luster
3 Purity: Mo&amp;ge;99.95%
4 Density: not less than 10.1g/cm3
5 Supply state: Su]]></description><pubDate><![CDATA[20140131]]></pubDate></item>
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<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium_Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>
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<title><![CDATA[Molybdenum Plates and Sheets]]></title><link><![CDATA[https://congmeizhang.en.ec21.com/Molybdenum_Plates_and_Sheets--8311136_8319335.html]]></link><description><![CDATA[1. Mo purity: 99.95% min. 
2. Color: Silver grey
3. Application: Used to produce electrode, heater, heat-shield, sputter target, crucible in electronic, vacuum furnace application.
4. Size: Thickness]]></description><pubDate><![CDATA[20140415]]></pubDate></item>
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<title><![CDATA[Aluminum 2219]]></title><link><![CDATA[https://attelements.en.ec21.com/Aluminum_2219--11822808_11854507.html]]></link><description><![CDATA[Aluminum Alloy
, We also produce disc, granules, ingot, pellets, pieces, powder , rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.
]]></description><pubDate><![CDATA[20231014]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://sophiaxi06.en.ec21.com/Molybdenum_Plate--11869270_11878365.html]]></link><description><![CDATA[sputtering target applied in plasma coating film, and high temperature resistance boat. When temperature is beyond 1200 degree centigrade, pure molybdenum will completely recrystallizate quickly. To ]]></description><pubDate><![CDATA[20231221]]></pubDate></item>

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