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<title><![CDATA[EC21 Product Catalogs - Sputtering]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/Sputtering.html]]></link><item>
<title><![CDATA[Upgraded Vertical Inline Sputter Coating Machine for TCO Film SIMVACO Thin Film Deposition PVD]]></title><link><![CDATA[https://simvaco.en.ec21.com/Upgraded_Vertical_Inline_Sputter_Coating--12034890_12037715.html]]></link><description><![CDATA[SIMVACO’s vertical inline magnetron sputtering system is engineered to deliver high-transparency conductive films with superior efficiency and precision. With advanced features like high-throughput]]></description><pubDate><![CDATA[20250118]]></pubDate></item>
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<title><![CDATA[OEM Monocrystalline Silicon Target, Silicon Blocks,Si Parts, Silicon Sputtering Target]]></title><link><![CDATA[https://huanaifei.en.ec21.com/OEM_Monocrystalline_Silicon_Target_Silicon--11859710_11859732.html]]></link><description><![CDATA[Silicon targets can generally be divided into two types: single crystal and polycrystalline.
The company uses Czochralski crystal growth technology and directional solidification growth technology to]]></description><pubDate><![CDATA[20241103]]></pubDate></item>
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<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG_Medium_Frequency_Magnetron_Sputtering--11960615_11986065.html]]></link><description><![CDATA[The magnetron multi arc sputtering coating machine generates glow discharge between the anode and cathode in a vacuum state, and gas molecules between the electrodes are ionized to generate charged c]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab_Equipment_Setcas_Magnetron_Sputtering--11981229_11981246.html]]></link><description><![CDATA[Parameters： 1. Size of quartz chamber: 150X120MM2. Sample size: 70mm3. Sputtering size: 50mm4. Maximum vacuum: 5pa5. Gas usable: Inert gases such as hydrogen, nitrogen, etc.6. Maximum sputtering sp]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
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<title><![CDATA[Multi-arc Magnetron Sputtering Composite Coating Equipment]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi_arc_Magnetron_Sputtering_Composite--11979832_11979839.html]]></link><description><![CDATA[Magnetron sputtering metallizer is mainly used for decorative and functional reaction films, which has the advantages of high deposition rate and fast reaction speed, and completely overcomes the phe]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
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<title><![CDATA[NiCr Alloy Nickel Chromium Alloy Target NiCr Sputtering Target for Pvd Coating]]></title><link><![CDATA[https://xinkang8888.en.ec21.com/NiCr_Alloy_Nickel_Chromium_Alloy--11706866_11980521.html]]></link><description><![CDATA[OEM Nickel chromium alloy Rotary Target NiCr Alloy Pipe NiCr10 NiCr20 NiCr30 Nickel Chromium Alloy Targets for Vapor deposited thin filmPurity99.99%-99.999%Size0.1mm, 0.2mm,0.5mm Other OEM sizeApplic]]></description><pubDate><![CDATA[20240805]]></pubDate></item>
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<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar_Alloy_Sputtering_Target--11928897_11928898.html]]></link><description><![CDATA[Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ens]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Perkin-Elmer 4400 Sputter Deposition Equipment]]></title><link><![CDATA[https://allwin21.en.ec21.com/Perkin_Elmer_4400_Sputter_Deposition--9763374_9763385.html]]></link><description><![CDATA[Allwin21 Brochures: Sputtering Deposition Equipment
PPT on Why AccuSputter AW4450 Sputter Deposition Equipment
Video on AccuSputter AW4450 Sputter Deposition Equipment
Allwin21 Brochures: Upgrade Kit]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium_Sputtering_Target--11858526_11931203.html]]></link><description><![CDATA[sputtering target please contact CS Titanium nb target
manufacturer.
Niobium Sputtering Target Specifications
Niobium Target Parameters
Recrystallization
95％min
Grain size
ASTM 4 or finer
Surface f]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[6N Copper and Copper Alloy Sputtering Target]]></title><link><![CDATA[https://cowinsemicon.en.ec21.com/6N_Copper_and_Copper_Alloy--11927707_11927708.html]]></link><description><![CDATA[sputtered into conductive layer on the wafer by using PVD process. Our products with IPAS technology is effectively improving the film quality, sputtering rate and yield of wafers. Materials lifetime]]></description><pubDate><![CDATA[20240422]]></pubDate></item>
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<title><![CDATA[Ultrasonic Sputtering Target Bonding Machine]]></title><link><![CDATA[https://mecstech.en.ec21.com/Ultrasonic_Sputtering_Target_Bonding_Machine--719392_4374124.html]]></link><description><![CDATA[It is widely used for coating indium on the various kinds of sputtering target. 
]]></description><pubDate><![CDATA[20140619]]></pubDate></item>
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<title><![CDATA[Rotary Target Sputtering Target for Industrial FPD Coating Nb Columbium Rotary Target]]></title><link><![CDATA[https://dan4613.en.ec21.com/Rotary_Target_Sputtering_Target_for--1695427_11359003.html]]></link><description><![CDATA[Sputtering
Targets , we has
ITO,SI, TIOX, NBOX, AZO, SIAL, ZNAL , match with PVD coating system such as Von
Ardenne, Boc, Airco,Amat, Leybold and other customized coating systems.
Ningbo Sen Ao Elect]]></description><pubDate><![CDATA[20211106]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://bjlhjs2012.en.ec21.com/Niobium_Sputtering_Target--7387516_7387531.html]]></link><description><![CDATA[Niobium Target
Specification: ASTM B 393 RO4210
State: annealed or unannealed
Shape: round or square target per you request
circular targets: Diameter 25-400mm x Thickness 3- 28mm
rectangular targets]]></description><pubDate><![CDATA[20220809]]></pubDate></item>
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<title><![CDATA[Roll To Roll Sputter]]></title><link><![CDATA[https://picomax.en.ec21.com/Roll_To_Roll_Sputter--7187863_7187973.html]]></link><description><![CDATA[Specification
Roll to Roll Sputter Vacuum equipment production and processing technologies, based on a technique for depositing metal on the polymer surface is secured.
Roll-to-roll sputtering equipm]]></description><pubDate><![CDATA[20121231]]></pubDate></item>
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<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[sputtering targets can work independently or at the same time 
The 
5. substrate &amp;le;60mm in diameter, can be heated to &amp;le;700℃, with water cooling, substrate speed adjustable, adjustable target b]]></description><pubDate><![CDATA[20170614]]></pubDate></item>
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<title><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)]]></title><link><![CDATA[https://hvm12.en.ec21.com/Sputtering_Target_Copper_Nickel_Ni7V--11499079_11547965.html]]></link><description><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)
________________________________________________
Copper Sputtering Target
Copper Sputtering Target 
L 426.5 mm * W 132mm * T 8mm
_____________________________]]></description><pubDate><![CDATA[20220330]]></pubDate></item>
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<title><![CDATA[China Products/Suppliers. Supply High Purity B4c Sputtering Target/99.5% Boron Carbide Target with B]]></title><link><![CDATA[https://susan607.en.ec21.com/China_Products_Suppliers._Supply_High--11866308_11866369.html]]></link><description><![CDATA[其特点是密度低、强度高、高温稳定性好、化学稳定性好。在耐磨材料中，陶瓷增强，特别是在轻装甲、反应堆中子吸收剂应用中。另外，与金刚石和]]></description><pubDate><![CDATA[20231114]]></pubDate></item>
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<title><![CDATA[Metal Sputtering Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Metal_Sputtering_Target--11825682_11857776.html]]></link><description><![CDATA[Metal pt sputtering target and au sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These]]></description><pubDate><![CDATA[20231023]]></pubDate></item>
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<title><![CDATA[308nm 254nm 190nm UV Bandpass Filter for Excimer Laser]]></title><link><![CDATA[https://meticulab.en.ec21.com/308nm_254nm_190nm_UV_Bandpass--12070016_12070972.html]]></link><description><![CDATA[sputtering – dense, durable, and high temperature resistance.
🔹 Customizable Center wavelength, bandwidth, substrate, size, and blocking depth.
🔹 Reliable Quality Each batch includes measured]]></description><pubDate><![CDATA[20260429]]></pubDate></item>
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<title><![CDATA[Yttrium Nitride Powder/Pellet]]></title><link><![CDATA[https://ledphor.en.ec21.com/Yttrium_Nitride_Powder_Pellet--10285650_10583348.html]]></link><description><![CDATA[Size
3-5um/8-15um/1-2mm/customized
Main Applications
Used in high-end electronics, sputtering target, fluorescent powder, ceramic materials, magnetic materials, semiconductor materials, coating.
]]></description><pubDate><![CDATA[20250401]]></pubDate></item>
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<title><![CDATA[Ultra-high Speed Fiber Laser Cutting Machine]]></title><link><![CDATA[https://cylion.en.ec21.com/Ultra_high_Speed_Fiber_Laser--11768484_12053306.html]]></link><description><![CDATA[sputtering, providing maximum safety for operators.
Whether in the field of industrial production lines or custom processing, our products can meet your needs, bringing you excellent cutting quality ]]></description><pubDate><![CDATA[20250331]]></pubDate></item>
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<title><![CDATA[High Purity Chromium Metal]]></title><link><![CDATA[https://jztyxc.en.ec21.com/High_Purity_Chromium_Metal--12051228_12051236.html]]></link><description><![CDATA[Scenarios: 
✓ High-temperature alloy additives for aircraft engines
✓ Base materials for semiconductor sputtering targets
✓ Corrosion-resistant materials for nuclear industry components
]]></description><pubDate><![CDATA[20250322]]></pubDate></item>
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<title><![CDATA[Automotive Window Film MIRROR LINE]]></title><link><![CDATA[https://smithclub.en.ec21.com/Automotive_Window_Film_MIRROR_LINE--12050613_12050764.html]]></link><description><![CDATA[Atomic-level metal coating
Manufacturing using sputtering technology
for long-lasting performance
99% UV Blockage
Helps maintain a comfortable indoor climate
and reduces vehicle interior heat
Natural]]></description><pubDate><![CDATA[20250320]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://finleycheung.en.ec21.com/Molybdenum_Sheet--12047319_12047323.html]]></link><description><![CDATA[sputtering target, and sapphire growth furnace components.
Our molybdenum sheets are available in thickness ranging from 0.25 mm to 4.75 mm, with a purity range of 99.9% to 99.95%. We also offer a va]]></description><pubDate><![CDATA[20250307]]></pubDate></item>
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<title><![CDATA[Low-E Glass]]></title><link><![CDATA[https://qzz1753.en.ec21.com/Low_E_Glass--12022307_12027449.html]]></link><description><![CDATA[sputtering coating onto the finished glass surface in vacuum chamber filled with an inert gas which is electrically charged and made molecules of metal to sputter onto the glass. It has more visible ]]></description><pubDate><![CDATA[20241126]]></pubDate></item>
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<title><![CDATA[15 &quot;embedded High-light Display Anti-glare Fully Fitted Capacitive Touch Screen Wide Temperature Wat]]></title><link><![CDATA[https://ccx666.en.ec21.com/15_embedded_High_light_Display--11863570_12020613.html]]></link><description><![CDATA[15 inch embedded high-light display front shell IP65 waterproof, effectively prevent water droplets from sputtering, water droplets can also be touched on the screen, suitable for outdoor industrial ]]></description><pubDate><![CDATA[20241025]]></pubDate></item>
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<title><![CDATA[Platinum Coated Titanium Bipolar Plates for PEM Production Hydrogen]]></title><link><![CDATA[https://bjyg.en.ec21.com/Platinum_Coated_Titanium_Bipolar_Plates--11722665_11724461.html]]></link><description><![CDATA[sputtering or evaporation. This process is often used for more precise applications where control over the thickness and properties of the platinum layer is critical.
4. Chemical Vapor Deposition (CV]]></description><pubDate><![CDATA[20240816]]></pubDate></item>
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<title><![CDATA[TiOx NbOx Cr2O3 Al2O3 YSZ Y2O3/YOF/YF3/YAG for Plasma Spray Coating]]></title><link><![CDATA[https://crownre2008.en.ec21.com/TiOx_NbOx_Cr2O3_Al2O3_YSZ--11957443_11985958.html]]></link><description><![CDATA[Sputtering materials, thermal spray coatingSilicon oxideSiO 99%Thermal spray coating surface treating materialsBeryllium oxide BeOBeO 99%Thermal spray coating surface treating materialsCobalt oxide C]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Tungsten Cube]]></title><link><![CDATA[https://luoyangyoubo.en.ec21.com/Tungsten_Cube--11970868_11970869.html]]></link><description><![CDATA[sputtering target
Pure Tungsten Cube Feature:
1. High density;
2. Good machine ability;
3. Good mechanical properties;
4. High modulus of elasticity;
5. High absorption capacity against χ-rays and ]]></description><pubDate><![CDATA[20240718]]></pubDate></item>
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<title><![CDATA[Thermal Conductive Graphite Sheet]]></title><link><![CDATA[https://ziitek2024.en.ec21.com/Thermal_Conductive_Graphite_Sheet--11939981_11970165.html]]></link><description><![CDATA[sputtering*****Total Thickness0.050 mm0.080 mmASTM D751The aluminum foil thickness0.030 mm0.050 mmASTM D751Single-sided coating Thickness0.010 mm0.015 mmASTM D751Thickness Tolerance+/- 10%+/- 10%ASTM]]></description><pubDate><![CDATA[20240717]]></pubDate></item>
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<title><![CDATA[Ref-dark Grey Glass]]></title><link><![CDATA[https://tuoyuan.en.ec21.com/Ref_dark_Grey_Glass--10878771_11207026.html]]></link><description><![CDATA[Reflective glass (coated
glass),also known as heat
reflective glass (solar control coated glass), it uses vacuum magnetron
sputtering method to electroplating ws0ay on the surface of high-quality flo]]></description><pubDate><![CDATA[20240715]]></pubDate></item>
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<title><![CDATA[Dark Grey Glass]]></title><link><![CDATA[https://amy231225.en.ec21.com/Dark_Grey_Glass--11924854_11924919.html]]></link><description><![CDATA[Reflective glass (coated glass),also known as heat reflective glass (solar control coated glass), it uses vacuum magnetron sputtering method to electroplating ws0ay on the surface of high-quality flo]]></description><pubDate><![CDATA[20240711]]></pubDate></item>
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<title><![CDATA[Monocrystalline Silicon Wafer]]></title><link><![CDATA[https://czboyan.en.ec21.com/Monocrystalline_Silicon_Wafer--11964559_11964560.html]]></link><description><![CDATA[sputtering growth sample, XRD, SEM, Atomic force, infrared spectroscopy, fluorescence spectroscopy and other analysis test substrates, molecular beam epitaxial growth substrates, X-ray analysis of cr]]></description><pubDate><![CDATA[20240707]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://mcwmo.en.ec21.com/Molybdenum_Plate--11837395_11962846.html]]></link><description><![CDATA[sputtering targets used in thin film deposition processes.High Temperature Furnaces:Production of molybdenum boats and molybdenum push plates used in high temperature furnaces.These components are ut]]></description><pubDate><![CDATA[20240704]]></pubDate></item>
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<title><![CDATA[Tungsten Plate]]></title><link><![CDATA[https://kktungstenmolybdenum.en.ec21.com/Tungsten_Plate--9967174_9967365.html]]></link><description><![CDATA[sputter target, crucible in electronic, vacuum furnace application.
W plate in Max size:
Thickness(mm)
Width(mm)
Length(mm)
1.5-2.0
150
200
2.0-3.0
200
250
3.0-4.0
250
600
4.0-6.0
300
600
6.0-8.0
300]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Ultra-Thin Peelable Copper Foil,Heat-Resistant Peelable Copper Foil]]></title><link><![CDATA[https://fpcfccl.en.ec21.com/Ultra_Thin_Peelable_Copper_Foil--11938956_11939079.html]]></link><description><![CDATA[Ultra-Thin Peelable Copper Foil Ultra-Thin Peelable Copper Foil TD-FEC is ultrathin copper foil produced using vacuum sputtering and electro-deposition technology,Mainly used in IC packaging, FPC mic]]></description><pubDate><![CDATA[20240518]]></pubDate></item>
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<title><![CDATA[797AUDIO ACR01 OEM/ODM Professional 3-PIN XLR Condenser Microphone with Shock Mount]]></title><link><![CDATA[https://797microphone.en.ec21.com/797AUDIO_ACR01_OEM_ODM_Professional--11930597_11930605.html]]></link><description><![CDATA[sputtered mylar diaphragm
→48V DC phantom powered,transformerless output
→High sensitivity,low noise and distortion,and extended frequency range
→Switchable -10dB pre-attenuation and low FQ rol]]></description><pubDate><![CDATA[20240429]]></pubDate></item>
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<title><![CDATA[99.999% Tungsten Target]]></title><link><![CDATA[https://linaqin.en.ec21.com/99.999_Tungsten_Target--2999626_7846403.html]]></link><description><![CDATA[Appearance: silvery metal.
Common uses:magnetron sputtering targets for semiconductor field and other high-tech fields.
Density: density&amp;ge;19.2g/cm&amp;sup3;
Size: available for customers&amp;rsquo;requests]]></description><pubDate><![CDATA[20171026]]></pubDate></item>
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<title><![CDATA[Chrome Target]]></title><link><![CDATA[https://kingchoice.en.ec21.com/Chrome_Target--1931314_1931551.html]]></link><description><![CDATA[Purity:2N5&amp;#65292;3N5 
Density:7.15g/cm3 
Specification:As Requested 
Processing Method:HIP]]></description><pubDate><![CDATA[20070618]]></pubDate></item>
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<title><![CDATA[High Purity Niobium Target]]></title><link><![CDATA[https://zhongbangtanb.en.ec21.com/High_Purity_Niobium_Target--7122904_7122971.html]]></link><description><![CDATA[Our company(Baoji Kedipu New Material Co.,LTD) is engaged in smelting, processing and selling rare metal materials. We supply all kinds products of tantalum, niobium, titanium, tungsten and molyvdenu]]></description><pubDate><![CDATA[20190617]]></pubDate></item>
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<title><![CDATA[TI-NI Alloy Target]]></title><link><![CDATA[https://chenfb2010.en.ec21.com/TI_NI_Alloy_Target--5949995_5950110.html]]></link><description><![CDATA[Sputtering Targets Materials list: 
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy]]></description><pubDate><![CDATA[20140221]]></pubDate></item>
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<title><![CDATA[Raytools BT-240 Fiber Laser Cutting Head]]></title><link><![CDATA[https://laserpowersource.en.ec21.com/Raytools_BT_240_Fiber_Laser--6991295_6991308.html]]></link><description><![CDATA[sputtering
3)
. collimating and focusing lens can choose of single lens or lens group, which can achieve the best optical quality and the effect of cutting
4)
. knob type of focus adjustment, meticul]]></description><pubDate><![CDATA[20230920]]></pubDate></item>
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<title><![CDATA[Bismuth Telluride Rod]]></title><link><![CDATA[https://hillcater.en.ec21.com/Bismuth_Telluride_Rod--10932672_10932769.html]]></link><description><![CDATA[Sputtering Target
Bi2Te3 Sputtering Target
Bi2Te3 Slugs
Bi2Te3 Slugs
Bismuth Telluride
Type: P type, N type
CAS No.:1304-82-1 EINECS No.:215-135-2 Molecular Formula:Bi2Te3 Molecular Weight:800.76
Mel]]></description><pubDate><![CDATA[20190402]]></pubDate></item>
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<title><![CDATA[99.95% Pure Molibdenum Plate]]></title><link><![CDATA[https://bjsymetal.en.ec21.com/99.95_Pure_Molibdenum_Plate--8359167_8642209.html]]></link><description><![CDATA[sputtering Targets
About us:
(1) We are a factory of rare earth metal products and have rich experience in making sputtering targets.
(2) Our products are strict by ISO 9001, good quality is promised]]></description><pubDate><![CDATA[20140131]]></pubDate></item>
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<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium_Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>
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<title><![CDATA[Molybdenum Plates and Sheets]]></title><link><![CDATA[https://congmeizhang.en.ec21.com/Molybdenum_Plates_and_Sheets--8311136_8319335.html]]></link><description><![CDATA[1. Mo purity: 99.95% min. 
2. Color: Silver grey
3. Application: Used to produce electrode, heater, heat-shield, sputter target, crucible in electronic, vacuum furnace application.
4. Size: Thickness]]></description><pubDate><![CDATA[20140415]]></pubDate></item>
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<title><![CDATA[Pure Mo Sheet for Vacuum Furnace&apos;s Chamber in China]]></title><link><![CDATA[https://cn04058551.en.ec21.com/Pure_Mo_Sheet_for_Vacuum--10370088_10844553.html]]></link><description><![CDATA[sputtering targets, crucibles in electronic and vacuum applications; 
2.Widely used for producing reflecting screen and cover inside sapphire crystal growth furnace, as well as reflecting screen, hea]]></description><pubDate><![CDATA[20181031]]></pubDate></item>
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<title><![CDATA[N P Type Bismuth Telluride Ingot Thermoelectric Bar Bi2te3 Rod with Cas 1304-82-1]]></title><link><![CDATA[https://highpuritymetals.en.ec21.com/N_P_Type_Bismuth_Telluride--11170695_11176170.html]]></link><description><![CDATA[Sputtering Target and other shapes, purity is 99.99%.Thermoelectric Cooler Peltiers are also available.
Bismuth Telluride Powder:gneral particle size is 100-1250mesh.Bismuth Telluride Pellet:gerneral]]></description><pubDate><![CDATA[20200617]]></pubDate></item>
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<title><![CDATA[Aluminized Polyimide Film]]></title><link><![CDATA[https://polyimidefilm.en.ec21.com/Aluminized_Polyimide_Film--10664508_10664519.html]]></link><description><![CDATA[Aluminized Polyimide Film
Formed by sputtering metal aluminum, then develops thin aluminum layer, with one side insulation, the other side high conduct electricity. It not only has the performance of]]></description><pubDate><![CDATA[20230627]]></pubDate></item>
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<title><![CDATA[Cylinder Neodymium Magnet]]></title><link><![CDATA[https://horizonmagnet.en.ec21.com/Cylinder_Neodymium_Magnet--10971914_10971938.html]]></link><description><![CDATA[sputtering cathodes, magnetic assemblies, holding applications, etc.
Main Test Items Prior to Delivery:
In order to ensure NdFeB magnets to meet requirements, we main test following items: size, weig]]></description><pubDate><![CDATA[20240111]]></pubDate></item>

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