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Products > metallic processing > Fujian Acetron New Materials CO. , Ltd | Similar Products

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metallic processing

" found 5 Products from Fujian Acetron New Materials CO. , Ltd, China

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(1-5 out of 5)

Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target: metals. Also have controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the ...

Rotary Metal Sputtering Targets: metals. Also have controlled specific impurities within the target High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of ...

Planar Metal Sputtering Targets: metals. Also have controlled specific impurities within the target High density: Metal targets have high density characteristics, usually up to 99%, to ensure the stability and quality of ...

Planar Ceramic Sputtering Target: metals. Also have controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the ...

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