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Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
source are accelerated to gather in the vacuum to form a high speed ion beam, which bombards the solid surface, and the kinetic energy exchange between the ions and the solid surface atoms makes the ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
surface coating. It is a method of transforming a solid material into a liquid or gaseous state and accelerating it to the target surface using physical vapor deposition techniques. It uses ions ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
/ Rotary Customized ITO Target (In₂O₃+SnO₂ ) 99.99% Planar / Rotary Customized AZO Target (ZnO+Al₂O₃ ) 99.99% Planar / Rotary Customized IGZO Target(In₂O₃+Ga₂O₃+ZnO) 99.99% Planar / ...
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