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<title><![CDATA[EC21 Product Catalogs - cu alloy sputtering target]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/cu alloy sputtering target.html]]></link><item>
<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar-Alloy-Sputtering-Target--11928897_11928898.html]]></link><description><![CDATA[Cu Alloy
99.99% / 99.999%
Planar
Customized
Mo Alloy
99.95%
Planar
Customized
Ni Alloy
99.99%
Planar
Customized
Si Alloy
99.99%
Planar / Rotary
Customized
Alloy sputtering targets
play a crucial role]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium-Sputtering-Target--11858526_11931203.html]]></link><description><![CDATA[Cu
≤10ppm
Mn
≤20ppm
Al
≤20ppm
C
≤260ppm
Si
≤20ppm
Niobium Sputtering Target Technological Process
Original Powder → HIP → Machine Process → Surface Treatment → Finished Products →]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[Zinc Oxide Targets]]></title><link><![CDATA[https://chenfb2010.en.ec21.com/Zinc-Oxide-Targets--5949956_5950183.html]]></link><description><![CDATA[Sputtering Targets Materials list: 
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy]]></description><pubDate><![CDATA[20140221]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://sophiaxi06.en.ec21.com/Molybdenum-Plate--11869270_11878365.html]]></link><description><![CDATA[sputtering target applied in plasma coating film, and high temperature resistance boat. When temperature is beyond 1200 degree centigrade, pure molybdenum will completely recrystallizate quickly. To ]]></description><pubDate><![CDATA[20231221]]></pubDate></item>

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