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<title><![CDATA[EC21 Product Catalogs - magnetron sputtering targets]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/magnetron sputtering targets.html]]></link><item>
<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab-Equipment-Setcas-Magnetron-Sputtering--11981229_11981246.html]]></link><description><![CDATA[hydrogen, nitrogen, etc.6. Maximum sputtering speed: 8nm/min7. Power: 200W8. Dimension: 360(W)X310(D)X150mm(H)9. With pumps and 1 target(Please contact me if you need the target for other materials)]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
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<title><![CDATA[99.9% Ti Titanium Sputtering Spraying Cylindrical Magnetron Targets]]></title><link><![CDATA[https://dan4613.en.ec21.com/99.9-Ti-Titanium-Sputtering--1695427_11359067.html]]></link><description><![CDATA[Magnetron Sputtering Targets and Rare materials .We are leading technology company in Sputtering Targets ,and Portble Solar resources .Our targets are used on Low E glass, solar panel Tco glass, touc]]></description><pubDate><![CDATA[20211106]]></pubDate></item>
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<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG-Medium-Frequency-Magnetron-Sputtering--11960615_11986065.html]]></link><description><![CDATA[The magnetron multi arc sputtering coating machine generates glow discharge between the anode and cathode in a vacuum state, and gas molecules between the electrodes are ionized to generate charged c]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Multi-arc Magnetron Sputtering Composite Coating Equipment]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi-arc-Magnetron-Sputtering-Composite--11979832_11979839.html]]></link><description><![CDATA[Magnetron sputtering metallizer is mainly used for decorative and functional reaction films, which has the advantages of high deposition rate and fast reaction speed, and completely overcomes the phe]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium-Sputtering-Target--11858526_11931203.html]]></link><description><![CDATA[sputtering targets.
Features of niobium sputtering target
Exceptional Purity: The niobium sputtering targets from CS Titanium boast exceptional purity, ensuring minimal contamination and the producti]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[Non Pressure Solar Water Heater]]></title><link><![CDATA[https://xinyidasolar2023.en.ec21.com/Non-Pressure-Solar-Water-Heater--11774694_11774695.html]]></link><description><![CDATA[tank: Galvanized color steel.
●Insulation: 50mm polyurethane foam for 72hrs heat preservation.
●Collector: Vacuum tube painted by magnetron sputtering selective.
●Bracket: Galvanized steel
]]></description><pubDate><![CDATA[20230423]]></pubDate></item>
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<title><![CDATA[Pvd Coating]]></title><link><![CDATA[https://richconncnc.en.ec21.com/Pvd-Coating--11781758_11781777.html]]></link><description><![CDATA[magnetron sputtering to name a few. HEF specializes in plasma enhanced magnetron sputtering, CAM (coating assisted by microwaves) and modified arc evaporation coating technologies. PVD coating techno]]></description><pubDate><![CDATA[20230504]]></pubDate></item>
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<title><![CDATA[DC Magnetron Sputtering Coating Machine- 2 Door for ABS Table Ware Application]]></title><link><![CDATA[https://vakiavacuumcoating.en.ec21.com/DC-Magnetron-Sputtering-Coating-Machine--9577671_9577672.html]]></link><description><![CDATA[The MSC1616 magnetron sputtering coating machine, is designed exclusively for ABS tableware: spoon, fork, knife&amp;#39;s application. Its 2-door structure design highly enhance the productivity. 
APPLIC]]></description><pubDate><![CDATA[20150707]]></pubDate></item>
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<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron-Sputtering-Machine--10304255_10438439.html]]></link><description><![CDATA[Magnetron Sputtering System
Magnetron sputtering source
One or two R60 magnetron sputtering targets
Target mounting position
Vacuum chamber plate
Power Supply
DC0.5KW,RF0.5KW each 1pc
target size
Rou]]></description><pubDate><![CDATA[20170614]]></pubDate></item>
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<title><![CDATA[Copper Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Copper-Target--11825682_11825684.html]]></link><description><![CDATA[sputtering techniques, such as two-pole sputtering, three-pole sputtering, four-pole sputtering, RF sputtering, ion beam sputtering, magnetron sputtering, and facing targets sputtering. It is suitabl]]></description><pubDate><![CDATA[20230727]]></pubDate></item>
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<title><![CDATA[99.999% Tungsten Target]]></title><link><![CDATA[https://linaqin.en.ec21.com/99.999-Tungsten-Target--2999626_7846403.html]]></link><description><![CDATA[Appearance: silvery metal.
Common uses:magnetron sputtering targets for semiconductor field and other high-tech fields.
Density: density&amp;ge;19.2g/cm&amp;sup3;
Size: available for customers&amp;rsquo;requests]]></description><pubDate><![CDATA[20171026]]></pubDate></item>
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<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium-Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>

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