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<title><![CDATA[EC21 Product Catalogs - sputtering deposition]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/sputtering deposition.html]]></link><item>
<title><![CDATA[Upgraded Vertical Inline Sputter Coating Machine for TCO Film SIMVACO Thin Film Deposition PVD]]></title><link><![CDATA[https://simvaco.en.ec21.com/Upgraded-Vertical-Inline-Sputter-Coating--12034890_12037715.html]]></link><description><![CDATA[deposition and real-time process control, it is ideal for display manufacturing and flexible electronics applications.
Vertical Inline Magnetron Sputtering Technology
High-Precision Vertical Depositi]]></description><pubDate><![CDATA[20250118]]></pubDate></item>
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<title><![CDATA[AccuSputter AW 4450 Sputter Deposition System]]></title><link><![CDATA[https://allwin21.en.ec21.com/AccuSputter-AW-4450-Sputter-Deposition--9763374_9763384.html]]></link><description><![CDATA[Allwin21 Brochures: Sputtering Deposition Equipment
PPT on Why AccuSputter AW4450 Sputter Deposition Equipment
Video on AccuSputter AW4450 Sputter Deposition Equipment
Allwin21 Brochures: Upgrade Kit]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
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<title><![CDATA[Platinum Coated Titanium Bipolar Plates for PEM Production Hydrogen]]></title><link><![CDATA[https://bjyg.en.ec21.com/Platinum-Coated-Titanium-Bipolar-Plates--11722665_11724461.html]]></link><description><![CDATA[Deposition (PVD):
PVD involves the physical deposition of platinum atoms onto a surface through methods like sputtering or evaporation. This process is often used for more precise applications where ]]></description><pubDate><![CDATA[20240816]]></pubDate></item>
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<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG-Medium-Frequency-Magnetron-Sputtering--11960615_11986065.html]]></link><description><![CDATA[deposit on the anode substrate to form a thin film. This physical phenomenon is called sputtering, which can be used for surface coating of various metals and non-metals and is an ideal equipment for]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Multi-arc Magnetron Sputtering Coating Machine]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi-arc-Magnetron-Sputtering-Coating--11981065_11981072.html]]></link><description><![CDATA[Cathode multi-arc superposition magnetron sputtering composite vacuum metallizer machine is built around the design concept of high efficiency, energy saving and high yield. 
This equipment combines ]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://mcwmo.en.ec21.com/Molybdenum-Plate--11837395_11962846.html]]></link><description><![CDATA[sputtering targets used in thin film deposition processes.High Temperature Furnaces:Production of molybdenum boats and molybdenum push plates used in high temperature furnaces.These components are ut]]></description><pubDate><![CDATA[20240704]]></pubDate></item>
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<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar-Alloy-Sputtering-Target--11928897_11928898.html]]></link><description><![CDATA[sputtering targets
play a crucial role in thin film deposition processes, enabling the fabrication of coatings with specific properties tailored to the requirements of diverse applications in industr]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Ultra-Thin Peelable Copper Foil,Heat-Resistant Peelable Copper Foil]]></title><link><![CDATA[https://fpcfccl.en.ec21.com/Ultra-Thin-Peelable-Copper-Foil--11938956_11939079.html]]></link><description><![CDATA[Ultra-Thin Peelable Copper Foil Ultra-Thin Peelable Copper Foil TD-FEC is ultrathin copper foil produced using vacuum sputtering and electro-deposition technology,Mainly used in IC packaging, FPC mic]]></description><pubDate><![CDATA[20240518]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium-Sputtering-Target--11858526_11931203.html]]></link><description><![CDATA[sputtering targets offer outstanding uniformity, ensuring consistent sputtering rates and uniform thin film deposition, which is crucial for the performance of the end product.
High-Density Targets: ]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[Titanium Aluminum Alloy Sputtering Target]]></title><link><![CDATA[https://sunlitem.en.ec21.com/Titanium-Aluminum-Alloy-Sputtering-Target--11765409_11765410.html]]></link><description><![CDATA[TiAlN coating is formed by the reaction of Titanium Aluminum Alloy Sputtering Target with nitrogen during the deposition process. It has good toughness and oxidation resistance, which greatly improve]]></description><pubDate><![CDATA[20230406]]></pubDate></item>
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<title><![CDATA[Pvd Coating]]></title><link><![CDATA[https://richconncnc.en.ec21.com/Pvd-Coating--11781758_11781777.html]]></link><description><![CDATA[Physical vapour deposition, just PVD coating, as we usually call it, refers to vacuum ion plating and vacuum sputter plating; Generally speaking, ncvm coating refers to vacuum evaporation coating. Th]]></description><pubDate><![CDATA[20230504]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://kktungstenmolybdenum.en.ec21.com/Molybdenum-Sheet--9967220_9967270.html]]></link><description><![CDATA[deposition sputtering target material, high temperature resistant boat and other products.
Specification:
Specification: (0.05-80) mm*max W760mm*max L30m
We produce high quality molybdenum sheet as o]]></description><pubDate><![CDATA[20220608]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://hsgmetal.en.ec21.com/Molybdenum-Sheet--11746113_11746123.html]]></link><description><![CDATA[deposition sputtering target material, High temperature boat dishes and other products.
Production Process of Molybdenum Sheet
Molybdenum billet (raw material)- inspection - hot rolling - leveling an]]></description><pubDate><![CDATA[20230313]]></pubDate></item>
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<title><![CDATA[Copper Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Copper-Target--11825682_11825684.html]]></link><description><![CDATA[sputtering, three-pole sputtering, four-pole sputtering, RF sputtering, ion beam sputtering, magnetron sputtering, and facing targets sputtering. It is suitable for the deposition of several types of]]></description><pubDate><![CDATA[20230727]]></pubDate></item>
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<title><![CDATA[Roll To Roll Sputter]]></title><link><![CDATA[https://picomax.en.ec21.com/Roll-To-Roll-Sputter--7187863_7187973.html]]></link><description><![CDATA[depositing metal on the polymer surface is secured.
Roll-to-roll sputtering equipment manufacturing and process technology has FCCL.
PICOMAX have a deposition technology on surface of polymer and set]]></description><pubDate><![CDATA[20121231]]></pubDate></item>
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<title><![CDATA[Sputtering Targets]]></title><link><![CDATA[https://tasco1986.en.ec21.com/Sputtering-Targets--6842854_6811021.html]]></link><description><![CDATA[competitive rates and are providing various sorts of sputtering targets, e-beam sources, powder, metal, oxides, alloys, precious metals, wires and plates which are involved in vacuum deposition.
]]></description><pubDate><![CDATA[20120703]]></pubDate></item>
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<title><![CDATA[MO1 99.95%min Polished Surface Molybdenum Target]]></title><link><![CDATA[https://bjsymetal.en.ec21.com/MO1-99.95-min-Polished-Surface--8359167_8651665.html]]></link><description><![CDATA[Molybdenum SputteringTarget 30mm&amp;times;500mm
1 Name: Molybdenum sputtering targets
2 Appearance: silver white metal luster
3 Purity: Mo&amp;ge;99.95%
4 Density: not less than 10.1g/cm3
5 Supply state: Su]]></description><pubDate><![CDATA[20140131]]></pubDate></item>
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<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium-Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>

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