Sell SS cavity RF DC 2 target magnetron sputtering coating instrument

Stainless steel cavity double target magnetron sputtering coating instrument is a small laboratory coating instrument with two targets developed by our company, which can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films , Dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed. The coating rate is high and the sample temperature rise is low. It is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water cooler can effectively take away the heat, avoid heat accumulation on the target surface, and make the magnetron coating work stably for a long time.

Technical Parameters:
Supply voltage  AC220V，50Hz Total power  3KW
Ultimate vacuum  10-6torr
Loading table parameters  
*Size  φ140mm
*Heating temperature  highest 500℃
*Temperature control accuracy  ±1℃
*Rotating speed  1-20rpm Adjustable
Magnetron sputtering head parameters  Quantity  two2”with 10L / min water cooling
Water cooler specifications  Circulating water cooler with 16L / min flow rate
Vacuum chamber  
*Cavity size  φ300mm X 300mm H
*Cavity material  stainless steel
*Observation window  φ100mm
*Opening method  Top opening type, easy to change target
Gas flow controller  4 channels through N2, Ar, O2, air; 0-500sccm
Vacuum pump  Equipped with a molecular pump system, pumping speed 600L/S
Sputtering power  
*One DC power supply, 500W, suitable for preparing metal film
*One RF power supply, 300W, suitable for non-metallic coating
Operation method  Panel button operation
Overall size  1400mm X 750mm X 1300mm
Total Weight  300kg