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<title><![CDATA[EC21 Product Catalogs - sputtering target]]></title>
<link><![CDATA[https://www.ec21.com/ec-market/sputtering target.html]]></link><item>
<title><![CDATA[OEM Monocrystalline Silicon Target, Silicon Blocks,Si Parts, Silicon Sputtering Target]]></title><link><![CDATA[https://huanaifei.en.ec21.com/OEM_Monocrystalline_Silicon_Target_Silicon--11859710_11859732.html]]></link><description><![CDATA[Silicon targets can generally be divided into two types: single crystal and polycrystalline.
The company uses Czochralski crystal growth technology and directional solidification growth technology to]]></description><pubDate><![CDATA[20241103]]></pubDate></item>
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<title><![CDATA[Lab Equipment Setcas Magnetron Sputtering SC-SU-I with Pump and 1 Target]]></title><link><![CDATA[https://setcas0925.en.ec21.com/Lab_Equipment_Setcas_Magnetron_Sputtering--11981229_11981246.html]]></link><description><![CDATA[hydrogen, nitrogen, etc.6. Maximum sputtering speed: 8nm/min7. Power: 200W8. Dimension: 360(W)X310(D)X150mm(H)9. With pumps and 1 target(Please contact me if you need the target for other materials)]]></description><pubDate><![CDATA[20240812]]></pubDate></item>
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<title><![CDATA[Nickel Chromium AlloyTarget NiCr20wt% NiCr30wt% NiCr Alloy Sputtering Target for Coating]]></title><link><![CDATA[https://xinkang8888.en.ec21.com/Nickel_Chromium_AlloyTarget_NiCr20wt_NiCr30wt--11706866_11980615.html]]></link><description><![CDATA[High Purity 99.99% Nickel Chromium Alloy Targets NiCr20wt% Sputtering Targets for Film Coating
Name
NiCr20wt% Sputtering Targets
Purity
99.99%
Size
D50.8x3mm, Or customize size
Application
Industry,e]]></description><pubDate><![CDATA[20240805]]></pubDate></item>
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<title><![CDATA[Planar Alloy Sputtering Target]]></title><link><![CDATA[https://acetron6.en.ec21.com/Planar_Alloy_Sputtering_Target--11928897_11928898.html]]></link><description><![CDATA[Planar Alloy Sputtering Target
Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc.
High purity: The metal target requires very high purity, to ens]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://cstitanium1.en.ec21.com/Niobium_Sputtering_Target--11858526_11931203.html]]></link><description><![CDATA[target film formation: over 95%.
Conventional density: ≥8.5 g/cm3
For more information about niobium sputtering target please contact CS Titanium nb target
manufacturer.
Niobium Sputtering Target S]]></description><pubDate><![CDATA[20240430]]></pubDate></item>
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<title><![CDATA[6N Copper and Copper Alloy Sputtering Target]]></title><link><![CDATA[https://cowinsemicon.en.ec21.com/6N_Copper_and_Copper_Alloy--11927707_11927708.html]]></link><description><![CDATA[targets is sputtered into conductive layer on the wafer by using PVD process. Our products with IPAS technology is effectively improving the film quality, sputtering rate and yield of wafers. Materia]]></description><pubDate><![CDATA[20240422]]></pubDate></item>
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<title><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)]]></title><link><![CDATA[https://hvm12.en.ec21.com/Sputtering_Target_Copper_Nickel_Ni7V--11499079_11547965.html]]></link><description><![CDATA[Sputtering Target (Copper, Nickel, Ni7V)
________________________________________________
Copper Sputtering Target
Copper Sputtering Target 
L 426.5 mm * W 132mm * T 8mm
_____________________________]]></description><pubDate><![CDATA[20220330]]></pubDate></item>
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<title><![CDATA[Supply High Purity B4c Sputtering Target/99.5% Boron Carbide Target with B]]></title><link><![CDATA[https://susan607.en.ec21.com/Supply_High_Purity_B4c_Sputtering--11866308_11866365.html]]></link><description><![CDATA[其特点是密度低、强度高、高温稳定性好、化学稳定性好。在耐磨材料中，陶瓷增强，特别是在轻装甲、反应堆中子吸收剂应用中。另外，与金刚石和]]></description><pubDate><![CDATA[20231130]]></pubDate></item>
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<title><![CDATA[Metal Sputtering Target]]></title><link><![CDATA[https://longhuatech.en.ec21.com/Metal_Sputtering_Target--11825682_11857776.html]]></link><description><![CDATA[Metal pt sputtering target and au sputtering targets are critical components of the sputtering process used in the manufacturing of thin films for semiconductor and other advanced applications. These]]></description><pubDate><![CDATA[20231023]]></pubDate></item>
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<title><![CDATA[Ultrasonic Sputtering Target Bonding Machine]]></title><link><![CDATA[https://mecstech.en.ec21.com/Ultrasonic_Sputtering_Target_Bonding_Machine--719392_4374124.html]]></link><description><![CDATA[It is widely used for coating indium on the various kinds of sputtering target. 
]]></description><pubDate><![CDATA[20140619]]></pubDate></item>
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<title><![CDATA[99.99% High Purity Indium Tin Oxide Rotating ITO Ceramic Sputtering ITO  Target]]></title><link><![CDATA[https://dan4613.en.ec21.com/99.99_High_Purity_Indium_Tin--1695427_11359065.html]]></link><description><![CDATA[Sputtering
Targets , we has
ITO,SI, TIOX, NBOX, AZO, SIAL, ZNAL , match with PVD coating system such as Von
Ardenne, Boc, Airco,Amat, Leybold and other customized coating systems.
Ningbo Sen Ao Elect]]></description><pubDate><![CDATA[20211106]]></pubDate></item>
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<title><![CDATA[Niobium Sputtering Target]]></title><link><![CDATA[https://bjlhjs2012.en.ec21.com/Niobium_Sputtering_Target--7387516_7387531.html]]></link><description><![CDATA[Niobium Target
Specification: ASTM B 393 RO4210
State: annealed or unannealed
Shape: round or square target per you request
circular targets: Diameter 25-400mm x Thickness 3- 28mm
rectangular targets]]></description><pubDate><![CDATA[20220809]]></pubDate></item>
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<title><![CDATA[Yttrium Nitride Powder/Pellet]]></title><link><![CDATA[https://ledphor.en.ec21.com/Yttrium_Nitride_Powder_Pellet--10285650_10583348.html]]></link><description><![CDATA[Size
3-5um/8-15um/1-2mm/customized
Main Applications
Used in high-end electronics, sputtering target, fluorescent powder, ceramic materials, magnetic materials, semiconductor materials, coating.
]]></description><pubDate><![CDATA[20250401]]></pubDate></item>
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<title><![CDATA[High Purity Chromium Metal]]></title><link><![CDATA[https://jztyxc.en.ec21.com/High_Purity_Chromium_Metal--12051228_12051236.html]]></link><description><![CDATA[Scenarios: 
✓ High-temperature alloy additives for aircraft engines
✓ Base materials for semiconductor sputtering targets
✓ Corrosion-resistant materials for nuclear industry components
]]></description><pubDate><![CDATA[20250322]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://finleycheung.en.ec21.com/Molybdenum_Sheet--12047319_12047323.html]]></link><description><![CDATA[sputtering target, and sapphire growth furnace components.
Our molybdenum sheets are available in thickness ranging from 0.25 mm to 4.75 mm, with a purity range of 99.9% to 99.95%. We also offer a va]]></description><pubDate><![CDATA[20250307]]></pubDate></item>
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<title><![CDATA[TiOx NbOx Cr2O3 Al2O3 YSZ Y2O3/YOF/YF3/YAG for Plasma Spray Coating]]></title><link><![CDATA[https://crownre2008.en.ec21.com/TiOx_NbOx_Cr2O3_Al2O3_YSZ--11957443_11985957.html]]></link><description><![CDATA[field;
2. Rotatable sputtering target materials, Cylindrical sputtering target materials, Flat target materials, Conductive ceramic diaphragm etc.
CrownRe Innovative Materials Corp. ]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[TG Medium Frequency Magnetron Sputtering-High-End Product Coating Machine]]></title><link><![CDATA[https://desionpvd.en.ec21.com/TG_Medium_Frequency_Magnetron_Sputtering--11960615_11986065.html]]></link><description><![CDATA[target material on the cathode, splashing out its atoms and other particles. The splashed atoms deposit on the anode substrate to form a thin film. This physical phenomenon is called sputtering, whic]]></description><pubDate><![CDATA[20240815]]></pubDate></item>
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<title><![CDATA[Multi-arc Magnetron Sputtering Composite Coating Equipment]]></title><link><![CDATA[https://meyalee.en.ec21.com/Multi_arc_Magnetron_Sputtering_Composite--11979832_11979839.html]]></link><description><![CDATA[target surface poisoning and abnormal glow discharge.
Metallizing single-layer films, multi-layer composite films, etc. on metal and non-metal substrates.
The updated cathode sputtering target and po]]></description><pubDate><![CDATA[20240807]]></pubDate></item>
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<title><![CDATA[Tungsten Cube]]></title><link><![CDATA[https://luoyangyoubo.en.ec21.com/Tungsten_Cube--11970868_11970869.html]]></link><description><![CDATA[sputtering target
Pure Tungsten Cube Feature:
1. High density;
2. Good machine ability;
3. Good mechanical properties;
4. High modulus of elasticity;
5. High absorption capacity against χ-rays and ]]></description><pubDate><![CDATA[20240718]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://mcwmo.en.ec21.com/Molybdenum_Plate--11837395_11962846.html]]></link><description><![CDATA[sputtering targets used in thin film deposition processes.High Temperature Furnaces:Production of molybdenum boats and molybdenum push plates used in high temperature furnaces.These components are ut]]></description><pubDate><![CDATA[20240704]]></pubDate></item>
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<title><![CDATA[Tungsten Plate]]></title><link><![CDATA[https://kktungstenmolybdenum.en.ec21.com/Tungsten_Plate--9967174_9967365.html]]></link><description><![CDATA[sputter target, crucible in electronic, vacuum furnace application.
W plate in Max size:
Thickness(mm)
Width(mm)
Length(mm)
1.5-2.0
150
200
2.0-3.0
200
250
3.0-4.0
250
600
4.0-6.0
300
600
6.0-8.0
300]]></description><pubDate><![CDATA[20240605]]></pubDate></item>
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<title><![CDATA[Upgrade Kits for Used Semiconductor Equipment]]></title><link><![CDATA[https://allwin21.en.ec21.com/Upgrade_Kits_for_Used_Semiconductor--9763376_9763390.html]]></link><description><![CDATA[sputter, since it is a little complicated, but we still target to upgrade within one week include training if the machine without other problems.
Upgraded Equipment Models :
Heatpulse 210
Heatpulse 4]]></description><pubDate><![CDATA[20240514]]></pubDate></item>
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<title><![CDATA[N P Type Bismuth Telluride Ingot Thermoelectric Bar Bi2te3 Rod with Cas 1304-82-1]]></title><link><![CDATA[https://highpuritymetals.en.ec21.com/N_P_Type_Bismuth_Telluride--11170695_11176170.html]]></link><description><![CDATA[Sputtering Target and other shapes, purity is 99.99%.Thermoelectric Cooler Peltiers are also available.
Bismuth Telluride Powder:gneral particle size is 100-1250mesh.Bismuth Telluride Pellet:gerneral]]></description><pubDate><![CDATA[20200617]]></pubDate></item>
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<title><![CDATA[Non Pressure Solar Water Heater]]></title><link><![CDATA[https://xinyidasolar2023.en.ec21.com/Non_Pressure_Solar_Water_Heater--11774694_11774695.html]]></link><description><![CDATA[tank: Galvanized color steel.
●Insulation: 50mm polyurethane foam for 72hrs heat preservation.
●Collector: Vacuum tube painted by magnetron sputtering selective.
●Bracket: Galvanized steel
]]></description><pubDate><![CDATA[20230423]]></pubDate></item>
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<title><![CDATA[Pvd Coating]]></title><link><![CDATA[https://richconncnc.en.ec21.com/Pvd_Coating--11781758_11781777.html]]></link><description><![CDATA[sputtering to name a few. HEF specializes in plasma enhanced magnetron sputtering, CAM (coating assisted by microwaves) and modified arc evaporation coating technologies. PVD coating technology is th]]></description><pubDate><![CDATA[20230504]]></pubDate></item>
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<title><![CDATA[Industry Nonferrous Materials Molybdenum Rings Round Circle Various Sizes]]></title><link><![CDATA[https://nonferrousmaterials.en.ec21.com/Industry_Nonferrous_Materials_Molybdenum_Rings--11853114_11853115.html]]></link><description><![CDATA[materials mold mold commonly use molybdenum.
Usage
Support wire, lead-in wire, printer needle, various electrodes and quartz furnaces, filament, high-speed tools, auto products,sputtering targets
]]></description><pubDate><![CDATA[20231011]]></pubDate></item>
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<title><![CDATA[Molybdenum Sheet]]></title><link><![CDATA[https://hsgmetal.en.ec21.com/Molybdenum_Sheet--11746113_11746123.html]]></link><description><![CDATA[sputtering target material, High temperature boat dishes and other products.
Production Process of Molybdenum Sheet
Molybdenum billet (raw material)- inspection - hot rolling - leveling and annealing]]></description><pubDate><![CDATA[20230313]]></pubDate></item>
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<title><![CDATA[Refractory Metal Molybdenum Parts Molybdenum Sheet for Vacuum Furnace From China]]></title><link><![CDATA[https://cn04058551.en.ec21.com/Refractory_Metal_Molybdenum_Parts_Molybdenum--10370088_11841810.html]]></link><description><![CDATA[sputtering targets, crucibles in electronic and vacuum applications;
2. Molybdenum are widely used for producing reflecting screen and cover inside
sapphire crystal growth furnace, as well as reflect]]></description><pubDate><![CDATA[20230906]]></pubDate></item>
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<title><![CDATA[Aluminum 2219]]></title><link><![CDATA[https://attelements.en.ec21.com/Aluminum_2219--11822808_11854507.html]]></link><description><![CDATA[Aluminum Alloy
, We also produce disc, granules, ingot, pellets, pieces, powder , rod, wire, sputtering target and in numerous other forms and custom shapes. Other shapes are available by request.
]]></description><pubDate><![CDATA[20231014]]></pubDate></item>
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<title><![CDATA[Magnetron Sputtering Machine]]></title><link><![CDATA[https://evapormaterial.en.ec21.com/Magnetron_Sputtering_Machine--10304255_10438439.html]]></link><description><![CDATA[sputtering targets can work independently or at the same time 
The 
5. substrate &amp;le;60mm in diameter, can be heated to &amp;le;700℃, with water cooling, substrate speed adjustable, adjustable target b]]></description><pubDate><![CDATA[20170614]]></pubDate></item>
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<title><![CDATA[Molybdenum Plate]]></title><link><![CDATA[https://sophiaxi06.en.ec21.com/Molybdenum_Plate--11869270_11878365.html]]></link><description><![CDATA[sputtering target applied in plasma coating film, and high temperature resistance boat. When temperature is beyond 1200 degree centigrade, pure molybdenum will completely recrystallizate quickly. To ]]></description><pubDate><![CDATA[20231221]]></pubDate></item>
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<title><![CDATA[99.999% Tungsten Target]]></title><link><![CDATA[https://linaqin.en.ec21.com/99.999_Tungsten_Target--2999626_7846403.html]]></link><description><![CDATA[Appearance: silvery metal.
Common uses:magnetron sputtering targets for semiconductor field and other high-tech fields.
Density: density&amp;ge;19.2g/cm&amp;sup3;
Size: available for customers&amp;rsquo;requests]]></description><pubDate><![CDATA[20171026]]></pubDate></item>
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<title><![CDATA[Silicon Target]]></title><link><![CDATA[https://kingchoice.en.ec21.com/Silicon_Target--1931314_1931605.html]]></link><description><![CDATA[Purity: Si 99.999% min.
Resistity: 0.2 ohm/cm min.
Type: both Single Crystal Silicon Target and Poly Crystal Silicon Targets can be supplied.
]]></description><pubDate><![CDATA[20090214]]></pubDate></item>
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<title><![CDATA[High Purity Niobium Target]]></title><link><![CDATA[https://zhongbangtanb.en.ec21.com/High_Purity_Niobium_Target--7122904_7122971.html]]></link><description><![CDATA[Our company(Baoji Kedipu New Material Co.,LTD) is engaged in smelting, processing and selling rare metal materials. We supply all kinds products of tantalum, niobium, titanium, tungsten and molyvdenu]]></description><pubDate><![CDATA[20190617]]></pubDate></item>
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<title><![CDATA[Tantalum Target]]></title><link><![CDATA[https://chenfb2010.en.ec21.com/Tantalum_Target--5949945_5950126.html]]></link><description><![CDATA[Sputtering Targets Materials list: 
Metal sputtering targets: Aluminum (Al),Antimony (Sb), Bismuth (Bi), Boron (B), Cadmium (Cd), Cerium (Ce), Chromium (Cr), Cobalt (Co), Copper ( Cu), Dysprosium (Dy]]></description><pubDate><![CDATA[20140221]]></pubDate></item>
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<title><![CDATA[Bismuth Telluride Rod]]></title><link><![CDATA[https://hillcater.en.ec21.com/Bismuth_Telluride_Rod--10932672_10932769.html]]></link><description><![CDATA[Sputtering Target
Bi2Te3 Sputtering Target
Bi2Te3 Slugs
Bi2Te3 Slugs
Bismuth Telluride
Type: P type, N type
CAS No.:1304-82-1 EINECS No.:215-135-2 Molecular Formula:Bi2Te3 Molecular Weight:800.76
Mel]]></description><pubDate><![CDATA[20190402]]></pubDate></item>
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<title><![CDATA[MO1 99.95%min Polished Surface Molybdenum Target]]></title><link><![CDATA[https://bjsymetal.en.ec21.com/MO1_99.95_min_Polished_Surface--8359167_8651665.html]]></link><description><![CDATA[Molybdenum SputteringTarget 30mm&amp;times;500mm
1 Name: Molybdenum sputtering targets
2 Appearance: silver white metal luster
3 Purity: Mo&amp;ge;99.95%
4 Density: not less than 10.1g/cm3
5 Supply state: Su]]></description><pubDate><![CDATA[20140131]]></pubDate></item>
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<title><![CDATA[Rhenium Target]]></title><link><![CDATA[https://rhenium.en.ec21.com/Rhenium_Target--7977235_11321324.html]]></link><description><![CDATA[Application：Rhenium target for magnetron sputtering target material deposition, magnetron sputtering deposition is a new kind of physical gas phase deposition (PVD), compared to the way of evaporat]]></description><pubDate><![CDATA[20230807]]></pubDate></item>
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<title><![CDATA[Molybdenum Plates and Sheets]]></title><link><![CDATA[https://congmeizhang.en.ec21.com/Molybdenum_Plates_and_Sheets--8311136_8319335.html]]></link><description><![CDATA[1. Mo purity: 99.95% min. 
2. Color: Silver grey
3. Application: Used to produce electrode, heater, heat-shield, sputter target, crucible in electronic, vacuum furnace application.
4. Size: Thickness]]></description><pubDate><![CDATA[20140415]]></pubDate></item>

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