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Polishing Material for Micro Devices

Polishing Material for Micro Devices
field Sapphire wafer adrasive Expected effects NEOMOND-AS Product characteristics Stabilizing the oxide film by sealing its micro-pores Non-toxic and eco-friendly sealing treatment for the human ...

Antistatic Agent, Carbon, Graphene, CNT

Antistatic Agent, Carbon, Graphene, CNT
by customers. Specification Electrostatic decay time <1 sec Particle size 60~100nm Apparent density 0.19 g/ml Carbon purity 98~99.9% Thermal conductivity 10.12 W/mk Surface resistance(Ω/sq) Product ...
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