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Polishing Material for Micro Devices

Poli<strong>s</strong>hing Material for Micro Device<strong>s</strong>
s 11,212 Water(1514), Helim(915) Chemical stability Stable in strong acid and alkali Corrosion in acid and alkali Thermal expansitivy 10-6K 0.8 Al2O3(8.0), BeO(5.9) Index of ...

Antistatic Agent, Carbon, Graphene, CNT

Anti<strong>s</strong>tatic Agent, Carbon, Graphene, CNT
Antistatic agent, Carbon, Graphene, CNT Features The main ingredient NPC of the NEO-AP series forms a spherical onion-like structure, making it easily applicable to various resins. NPC is an ...
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