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Suppliers > sputtering > Hunan Ultra Minor Metals Ltd | Matching Products

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Ru Target,Ruthenium Sputtering Target: Purity: 99.95% Applications: vacuum coating, ruthenium target materials for experimental or research grade, electronic, optoelectronic, military, decorative plating, functional film, etc Physical ...

High Purity Tungsten Target, 99.99% Min Tungsten Sputtering Target: Application: High-purity tungsten targets, high-purity tungsten-titanium alloy targets, and tungsten-silicon composite targets are usually applied by magnetron sputtering to produce various complex ...

99.95% High Purity Iridium Target: Name: Iridium CAS：7439-88-5 Symbol：Ir Thermal conductivity：147W/(m·K) Atomic weight：192.22 Density：22.56g/cm3 Purity：3N5 Resistivity：47.1 nΩ·m (at 20 °C) Specification Status PuritySizeHigh purity ...

High Purity Titanium Target: 纯度大于4N（99.99%）的钛称为高纯钛。与一般工业纯钛相比，高纯主要是纯钛或钛与其他元素形成合金或化合物的形式，用于电子和半导体工业生产溅射靶材，如制造半导体超大规模集成电路，钨钛、钛、钛氮化合物或合金材料在扩散阻挡层和材料分布后被溅射涂层。此外，高纯钛还用于一些特殊行业，如生物医用材料、一些高端配件和一些配件；特殊合金、功能材料，如制备 Ti-Ni 形状记忆合金和 Ti-Al ...

High Purity Tantalum Target: Product manual Tantalum, a metallic element, mainly exists in tantalite and co-exists with niobium. The texture of tantalum is very hard, the hardness can reach 6-6.5. Its melting point is as high as ...

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Ru Target,Ruthenium Sputtering Target