Search Advanced Search
Products > control components > Fujian Acetron New Materials CO. , Ltd | Similar Products
Your search for "

control components

" found 3 Products from Fujian Acetron New Materials CO. , Ltd, China

(1-3 out of 3)

Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. * Maximum sizes of planar target ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...
Page 1 of 11
Go to Page Go

Browse: Manufacturer Directory Premium Suppliers Site Map

About EC21 Contact Us Terms & Conditions Report Item Online Trading Risks Product Listing Policy

Copyright (c)1997-2026 EC21 Inc. All Rights Reserved. EC21 in KoreanChinese

Business Registry Number: 120-86-03931 | Mall order sales Registration Number: 강남-5838

Inquiry Basket ()