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Products > grain processing > Fujian Acetron New Materials CO. , Ltd | Similar Products

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grain processing

" found 3 Products from Fujian Acetron New Materials CO. , Ltd, China

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Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Metal Sputtering Targets: grain: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes ...

Planar Metal Sputtering Targets: grain: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes ...

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Planar Alloy Sputtering Target