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" found 7 Products from ALLWIN21 Corp., United States

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AW-2001R Microwave Plasma Etcher: Condition: NewWafer Size: 2″ – 6″ CapabilityWafer Loading: 3-axis RobotPlasma Power: MicrowaveType: Parallel/Single Wafer Process; Stand-AloneGas Lines: 4 LinesFree Fast Quote: Link Downloads: ...

AW-B3000 Barrel Plasma Asher Descum: Allwin21 Corp. has been focusing on providing solutions and enhancements to Branson/IPC 3000, Branson/IPC L3200 used plasma Asher Descum semiconductor process equipment. These OEM semiconductor ...

AW-105R Plasma Asher Plasma Descum: Condition: NewWafer Size: 2″ – 6″ CapabilityWafer Loading: 3-axis Robot; Stationary Cassette Plate (Video)Plasma Power: 600W Air-Cooled RF 13.56MHzType: Parallel/Single Wafer Process; Stand-AloneGas ...

AW-1008 Plasma Asher Semiconductor Process Equipment: Manufacturer: Allwin21Condition: NewWafer Size: 3″ – 6″ CapabilityWafer Loading: 3-axis Robot wafer transfer (Video)Plasma Power: MicrowaveType: Parallel/Single Wafer Process; Stand-AloneGas Lines: ...

Perkin-Elmer 4400 Sputter Deposition Equipment: Condition. ~3xDelta Shape OR ~4xCircle Shape Continue ReadingPerkin-Elmer 4400 SputterbySputter Deposition EquipmentPerkin-ELmer 4400 Sputter: Manual, with Load Lock,RF/DC; Diode/Magnetron, Wafer ...

AccuSputter AW 4450 Sputter Deposition System: Allwin21 Brochures: Sputtering Deposition Equipment PPT on Why AccuSputter AW4450 Sputter Deposition Equipment Video on AccuSputter AW4450 Sputter Deposition Equipment Allwin21 Brochures: Upgrade ...

AccuThermo AW 820 Rapid Thermal Annealer: Manufacturer: Allwin21 Corp.Condition: NewWafer Size: Small~8 inchType: Stand Alone, AtmosphericTemperature: 100~800°C or 450~1250°C. Long time and Higher temperature processes are available. Pls ...

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