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AW-2001R Microwave Plasma Etcher

AW-2001R Microwave Plasma Etcher
process control system with PC, solid robotic wafer transfer system (Video-1000 ; Video-3000/3010/L3510) and new critical components to achieve the goal of giving our customers a production edge with ...

AW-105R Plasma Asher Plasma Descum

AW-105R Plasma Asher Plasma Descum
process control system with PC, solid robotic wafer transfer system(Video) and new critical components to achieve the goal of giving our customers a production edge with right cost. Manufacturer: ...

AW-1008 Plasma Asher Semiconductor Process Equipment

AW-1008 Plasma Asher Semiconductor <strong>Process</strong> Equipment
Manufacturer: Allwin21Condition: NewWafer Size: 3″ – 6″ CapabilityWafer Loading: 3-axis Robot wafer transfer (Video)Plasma Power: MicrowaveType: Parallel/Single Wafer Process; Stand-AloneGas Lines: ...

AccuThermo AW 820 Rapid Thermal Annealer

AccuThermo AW 820 Rapid Thermal Annealer
Manufacturer: Allwin21 Corp.Condition: NewWafer Size: Small~8 inchType: Stand Alone, AtmosphericTemperature: 100~800°C or 450~1250°C. Long time and Higher temperature processes are available. Pls ...

AccuThermo AW 610M Rapid Thermal Annealing

AccuThermo AW 610M Rapid Thermal Annealing
Lines: MFCs, 6 lines capability .Typically, Nitrogen (N2), oxygen (O2), argon (Ar), helium (He) , Forming Gases, NH3, N2O2 etc. are used. Chamber Design: 40-years-proven Heating chamber’s cold-wall ...

AccuThermo AW 610M Rapid Thermal Process

AccuThermo AW 610M Rapid Thermal <strong>Process</strong>
Lines: MFCs, 6 lines capability .Typically, Nitrogen (N2), oxygen (O2), argon (Ar), helium (He) , Forming Gases, NH3, N2O2 etc. are used. Chamber Design: 40-years-proven Heating chamber’s cold-wall ...

AccuThermo AW Series Rapid Thermal Processing

AccuThermo AW Series Rapid Thermal <strong>Processing</strong>
Process Equipment, Vacuum Rapid Thermal Process AccuThermo AW 820 RTP, 150-840 C or 400-1250 C. 1-6 gas lines with MFCs. Small samples to 8inch Round/Square Substrate. Stand Alone. With Vacuum ...
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