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Niobium Sputtering Target: powder) Ta ≤500ppm Cr ≤20ppm N ≤370ppm H ≤19ppm Ni ≤20ppm Fe ≤80ppm Ti ≤20ppm Mo ≤30ppm W ≤50ppm Cu ≤10ppm Mn ≤20ppm Al ≤20ppm C ≤260ppm Si ≤20ppm Niobium Sputtering Target Technological ...

Molybdenum Target: powder) Pb ≤5ppm C ≤20ppm Cd ≤5ppm Sb ≤10ppm Si ≤10ppm Ni ≤30ppm Cu ≤10ppm P ≤5ppm Mg ≤10ppm N ≤50ppm Bi ≤5ppm Al ≤15ppm Ca ≤15ppm N ≤ppm Note: all the specifications can meet the requirements of ...

Molybdenum Electrode: Molybdenum electrode made by powder metallurgy technology with pure molybdenum powder has high melting point, high temperature strength and hardness, good thermal shock resistance, good electrical ...

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Niobium Sputtering Target