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Niobium Sputtering Target: C ≤260ppm Si ≤20ppm Niobium Sputtering Target Technological Process Original Powder → HIP → Machine Process → Surface Treatment → Finished Products →Packaging → Inspection Niobium Sputtering Target ...

Molybdenum Target: C ≤20ppm Cd ≤5ppm Sb ≤10ppm Si ≤10ppm Ni ≤30ppm Cu ≤10ppm P ≤5ppm Mg ≤10ppm N ≤50ppm Bi ≤5ppm Al ≤15ppm Ca ≤15ppm N ≤ppm Note: all the specifications can meet the requirements of customers on high ...

Molybdenum Rod: Grade: Mo1 Mola TZM Standard: GB/T4188-1984 Surface condition: Black, Alkali wash, Bright, polished. Molybdenum Rod Specification Chemical ...

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