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Niobium Sputtering Target

Niobium Sputtering Target
Fe ≤80ppm Ti ≤20ppm Mo ≤30ppm W ≤50ppm Cu ≤10ppm Mn ≤20ppm Al ≤20ppm C ≤260ppm Si ≤20ppm Niobium Sputtering Target Technological Process Original Powder → HIP → Machine Process → Surface Treatment → ...

Molybdenum Rod

<strong>Mo</strong>lybdenum Rod
Grade: Mo1 Mola TZM Standard: GB/T4188-1984 Surface condition: Black, Alkali wash, Bright, polished. Molybdenum Rod Specification Chemical ...
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