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Niobium Sputtering Target

<strong>N</strong>iobium Sputteri<strong>n</strong>g Target
N ≤370ppm H ≤19ppm Ni ≤20ppm Fe ≤80ppm Ti ≤20ppm Mo ≤30ppm W ≤50ppm Cu ≤10ppm Mn ≤20ppm Al ≤20ppm C ≤260ppm Si ≤20ppm Niobium Sputtering Target Technological Process Original Powder → HIP → Machine ...

Molybdenum Target

Molybde<strong>n</strong>um Target
processed by high-quality bars, and feature accurate dimensions, smooth surface, high purity, etc. Molybdenum sputtering target of the conventional size are produced by a hot isostatic pressing ...
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