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PR Pump and Photo Resist Pump

PR Pump and Photo Resist Pump
PROCESS Maximum Dispense Volume 8.0cc Dispense / Reload Rate 0.1cc/sec ~ 4.0cc/sec Dispense Volume Resolution 0.1cc Dispense Repeatability ±0.1 (0.8cp, 23°C) Viscosity Max : ...

LED / Wafer Track System

LED / Wafer Track System
2~4inch, 6~8inch, 12inch Inch Multi Flow Process Compact and Small Size Sapphire,Glass, Si PSS,MEMS,Bumping process Programmable EBR, Back Rinse as well as Bowl Bar Code System (Optional) and USB ...
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