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Wet Metal Chemical Etching Machine and PCB Etching Machine: process. After etching, dissolve the unnecessary photoresist film. Depending on the type of photo registry, sodium hydroxide heated around 40 to 80℃ or 100℃ is commonly used. In the case of special ...

Chemical Etching Tungsten Alloy Metal Etching Tungsten: and H2SO4 (Piranha solution)Room temperature30% H2O2, 70% H2SO45-20High-quality (smooth)Etching TungstenNH4OH and H2O2Room temperature30% NH4OH, 3% H2O22-15High-quality (smooth)Etching Tungsten ...

Chemical Etching Titanium Alloy Metal Etching Titanium: EtchantRoom temperature10% CuCl210-50High-quality (smooth)Etching Titanium-Nickel (Ti-Ni)Sodium Hydroxide (NaOH)Room temperature10-20% NaOH10-50High-quality (smooth)Etching Titanium Process ...

Chemical Etching Nickel Alloy Metal Etching Nickel: Chloride EtchantRoom temperature10% FeCl310-50High-quality (smooth)Etching Nickel-Iron Alloys (Invar)Hydrofluoric Acid (HF)Room temperature5% HF10-40High-quality (smooth)Etching Nickel Processing ...

Chemical Etching Molybdenum or Molybdenum Copper: temperature10% CuCl210-50High-quality (smooth)Etching Molybdenum-Tungsten (MoCu)Sodium Hydroxide (NaOH)Room temperature10-20% NaOH10-50High-quality (smooth)Etching Molybdenum Process GuidelinesThe ...

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Wet Metal Chemical Etching Machine and PCB Etching Machine