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Nickel Vanadium Alloy Target NiV Magnetron Target 99.95% Purity for Thin Film Coating: High Purity 99.95% Nickel Vanadium Alloy Targets NiV7wt% Sputtering Targets for Film Coating Name NiV7wt% Sputtering Targets Purity 99.95% Size D50.8x3mm, Or customize size Application Industry ...

Nickel Chromium AlloyTarget NiCr20wt% NiCr30wt% NiCr Alloy Sputtering Target for Coating: High Purity 99.99% Nickel Chromium Alloy Targets NiCr20wt% Sputtering Targets for Film Coating Name NiCr20wt% Sputtering Targets Purity 99.99% Size D50.8x3mm, Or customize size Application Industry ...

XinKang Factory Supply NiV7wt% Target Nickel-Vanadium Alloy Sputtering Targets for PVD Coating: High Purity 99.95% Nickel Vanadium Alloy Targets NiV7wt% Sputtering Targets for Film Coating Name NiV7wt% Sputtering Targets Purity 99.95% Size D50.8x3mm, Or customize size Application Industry ...

99.5% Purity Titanium Nitride Ceramic Targets TiN Sputtering Target for PVD Film Coating: High Purity 99.5% Purity Titanium nitride Ceramic Targets TiN Sputtering Target for PVD Film Coating NameTitanium nitride Ceramic Targets TiNSizeD50.8x3mm,As requestPurity99.5%Application Evaporation ...

XinKang 99.99% Titanium Targets Customize Size Metal Ti Sputtering Targets for PVD Film Coating: 3530 ° C; Melting point 1720 ° C; Density: relative density (water = 1)4.5; Main application: used in alloy manufacture, etc. Shape:Round or rectangularTechnology:Vacuum meltingApplication:PVD ...

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Nickel Vanadium Alloy Target NiV Magnetron Target 99.95% Purity for Thin Film Coating