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Products > semiconductor > Changsha Xinkang Advanced Materials Corporation Ltd | Similar Products

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" found 7 Products from Changsha Xinkang Advanced Materials Corporation Ltd, China

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OEM High Purity Vanadium Sputtering Target: Item Name Vanadium (V) sputtering target Available Purity 2N5, 3N Dimension As per your request Available Shape Planar, round Density 6.11g/m³ Melting point 1890℃ Boiling ...

OEM High Purity Aluminium Sputtering Target: Item Name Aluminium (Al) sputtering target Available Purity 3N5,4N,4N6,5N,6N Dimension As per your request Available Shape Planar, Rotary Density 2.70g/m³ Melting point 660.37℃ Boiling ...

OEM High Purity Copper Sputtering Target: Item Name Copper (Cu) sputtering target Available Purity 4N, 5N, 6N Dimension As per your request Available Shape Planar, round Density 8.954g/m³ Melting point 1083℃ Boiling ...

OEM High Purity Cobalt Sputtering Target: Item Name Cobalt (Co) sputtering target Available Purity 3N6, 4N, 5N Dimension As per your request Available Shape Planar, Rotary Density 8.89g/m³ Melting point 1495℃ Boiling ...

OEM High Purity Nickel Iron Sputtering Target: Item Name Nickel Iron (NiFe) sputtering target Available Purity 3N5,4N Dimension As per your request Available Shape Planar, round Technology Vacuum Melting, Patented thermo-mechanical process and ...

OEM High Purity Nickel Chromium Sputtering Target: Item Name Nickl Chromium (NiCr20) sputtering target Available Purity 3N,3N6,4N Dimension As per your request Available Shape Planar, round Technology Vacuum Melting, Patented thermo-mechanical ...

OEM High Purity Tantalum Sputtering Target: Item Name Tantalum (Ta) sputtering target Available Purity 3N,3N5,4N Dimension As per your request Available Shape Planar, round Density 16.654g/m³ Melting point 2996℃ Boiling ...

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OEM High Purity Vanadium Sputtering Target