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" found 5 companies from Fujian Acetron New Materials CO. , Ltd, China

(1-5 out of 5)

Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
materials extensively utilized in modern industry. They are primarily employed in the sputtering process for thin film deposition across various industries, including semiconductor, electronics, ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the ...
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