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Suppliers > coating > Fujian Acetron New Materials CO. , Ltd | Matching Products

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Planar Alloy Sputtering Target: / 99.999% Planar Customized Mo Alloy 99.95% Planar Customized Ni Alloy 99.99% Planar Customized Si Alloy 99.99% Planar / Rotary Customized Alloy sputtering targets play a crucial role in thin film ...

Rotary Ceramic Sputtering Target: coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...

Rotary Metal Sputtering Targets: x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets: coating. It is a method of transforming a solid material into a liquid or gaseous state and accelerating it to the target surface using physical vapor deposition techniques. It uses ions produced by ...

Planar Ceramic Sputtering Target: coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...

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Planar Alloy Sputtering Target