Buy Now

Sell Now

My EC21

Search Advanced Search

Suppliers > for coating > Fujian Acetron New Materials CO. , Ltd | Matching Products

Your search for "

for coating

" found 5 companies from Fujian Acetron New Materials CO. , Ltd, China

Inquire Now

(1-5 out of 5)

Planar Alloy Sputtering Target: / 99.999% Planar Customized Mo Alloy 99.95% Planar Customized Ni Alloy 99.99% Planar Customized Si Alloy 99.99% Planar / Rotary Customized Alloy sputtering targets play a crucial role in thin film ...

Rotary Ceramic Sputtering Target: coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...

Rotary Metal Sputtering Targets: for round target) Width: max 2000mm Length: max 4000mm * Maximum sizes of rotary target Vacuum/Air Spraying Backing tubes: ID56 x OD64 x Length300~3000mm, Thickness: 3~5mm Backing tubes: ID78~83 x ...

Planar Metal Sputtering Targets: for thin film deposition across various industries, including semiconductor, electronics, optics, and surface coating. It is a method of transforming a solid material into a liquid or gaseous state ...

Planar Ceramic Sputtering Target: coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...

Page 1 of 11

Go to Page Go

Planar Alloy Sputtering Target