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Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
semiconductor characteristics. * Maximum sizes of planar target Thickness: 30mm (can be 60mm for round target) Width: max 2000mm Length: max 4000mm * Maximum sizes of rotary target Vacuum/Air ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
semiconductor, electronics, optics, and surface coating. It is a method of transforming a solid material into a liquid or gaseous state and accelerating it to the target surface using physical vapor ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
semiconductor characteristics. * Maximum sizes of planar target Thickness: 30mm (can be 60mm for round target) Width: max 2000mm Length: max 4000mm * Maximum sizes of rotary target Vacuum/Air ...
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