Min. Order:
2 Metric Ton
Price:
US$ 1400 ~ 1600
Place of origin:
China
Supply Ability:
150,000 Metric Tons
of HSD series is an opalescent liquid, slightly more viscous than water. Applications: As a polishing agent or abrasive in CMP or electronics industry, or other applications where large particle size colloidal silica is required. Get in touch with us at www.adventsilica.com Learn more at https://www.adventsilica.com/colloidal-silica-products/large-particle-line Other Products Available:
[Related Keywords : CMP slurry, Abrasive, CMP, Colloidal Silica]
Business Type
Supplier
Location
New Jersey, United States
Employees Total
101 - 500
Annual Revenue
USD 500,001 - 1,000,000
Min. Order:
1 Liter
Price:
US$ 11.5 ~ 15.5
Place of origin:
China
GRISH CMP slurry takes colloidal silica as base with unique formula design according to different polishing requirements. Stable pH value keeps polishing rate stable and saves polishing time. It can be widely used in the chemical mechanical polishing for various materials, such as sapphire, semiconductor materials (ex. Si, Ge, GaAs, InP, SiC, GaN, AlN), stainless steel, aluminum magnesium alloy a
[Related Keywords : CMP slurry, SO polishing slurry, grinding liquid, polising grinding slurry]
Business Type
Manufacturer
Location
Beijing, China
Employees Total
101 - 500
Annual Revenue
USD 1,000,001 - 2,000,000
Place of origin:
Korea
CMP Slurry Abrasive In the semiconductor manufacturing process, Chemical Mechanical Polishing (CMP) is a technique used in semiconductor fabrication for planarizing the top surface of an in-process semiconductor wafer. In CMP process, the semiconductor substrate is polished by metal-oxide slurry using elastomer pad. According to the substrate, the process is consists of ILD, STI, and metal CMP. G
[Related Keywords : slurry abrasive, konasil]
Business Type
Supplier
Location
Seoul, Korea
Employees Total
1 - 5
Annual Revenue
USD 100,000 - 500,000
Place of origin:
Korea
CMP Slurry Filters •Available in micron ratings 50nm, 70nm, 0.1㎛, 0.2㎛, 0.45㎛, 1㎛ •Graded density filter media construction provides high dirt holding capacity and longer filter life •Composite nanofibers provides high performance in filtration AbsPFATM All Fluoropolymer Filter Cartridges •Available in micron ratings 15nm, 20nm, 30nm, 50nm, 0.1㎛, 0.2㎛, 0.45㎛ •All Fluoropol
[Related Keywords : METAL ION REMOVE FILTER, LIQUID CARTRIDGE FILTER]
Business Type
Manufacturer
Location
Gyeonggi-do, Korea
Employees Total
51 - 100
Annual Revenue
USD 10,000,001 - 50,000,000
Place of origin:
China
According to the characteristics of copper material and high requirements of the 3C fabricate, Kona nano alumina water-based copper cmp slurry provides a good surface finish with no compromise on the polishing rate. Polishing Slurry for 3C Copper Accessories 1 Copper is a soft metal (Mohs hardness 3), and it is a highly reactive metal and it oxidized very easily. That increases the difficulty of
[Related Keywords : cu cmp slurry]
Business Type
Supplier
Location
Jiangsu, China
Employees Total
6 - 10
Annual Revenue
Less than USD 100,000
Video
Min. Order:
1 Roll
Price:
US$ 1200
Place of origin:
China
CMP slurry filtrationTwo membranes with different pore sizes were used.(0.5um and 1.0um)Exclude unsuitable particles. ( >1.0um and <0.5um)Obtain the suspended abrasive particles in the target range. (0.5um--1.0um)Correct rate and intercept rate > 97%. The loss is very small.Semiconductor/chip CMP slurry filtration data comparison 2. The filtration and sterilization functions of liquid medicines a
[Related Keywords : Track Etched Membrane, PET/PC Heavy Ion Micropo, Nuclear Porous Membrane, Filter membrane]
Business Type
Manufacturer
Location
Guangdong, China
Employees Total
11 - 50
Annual Revenue
USD 100,000 - 500,000
Min. Order:
3000 Piece
Price:
US$ 4 ~ 40
Place of origin:
Korea
Description CMP(Chemical Mechanical Polishing)filter cartridges is constructed of polypropylene filter media to ensure high efficiency by layering filter media inside of the filter. CMP filter is used for the filtration of both oxide and metal slurry at chemical mechanical polishing process. This multi-layer depth structure provides high dirt holding capacity. Available in a wide absolute filter
[Related Keywords : Absolute Depth Filter, Liquid Filtering, Purifying, Cartridge]
Business Type
Manufacturer
Location
Gyeonggi-do, Korea
Employees Total
11 - 50
Annual Revenue
USD 500,001 - 1,000,000
Competitive cmp slurry products from various cmp slurry manufacturers and cmp slurry suppliers are listed above, please select quality and cheap items for you.
Besides, we also provide you with related products such as colloidal silica, wafer polishing slurry and oxide slurry for your choice.
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