Buy Now

Sell Now

My EC21

Search Advanced Search

Products > Process control > Fujian Acetron New Materials CO. , Ltd | Similar Products

Your search for "

Process control

" found 5 Products from Fujian Acetron New Materials CO. , Ltd, China

Inquire Now

(1-5 out of 5)

Planar Alloy Sputtering Target: / 99.999% Planar Customized Mo Alloy 99.95% Planar Customized Ni Alloy 99.99% Planar Customized Si Alloy 99.99% Planar / Rotary Customized Alloy sputtering targets play a crucial role in thin film ...

Rotary Ceramic Sputtering Target: controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality ...

Rotary Metal Sputtering Targets: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...

Planar Metal Sputtering Targets: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...

Planar Ceramic Sputtering Target: controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality ...

Page 1 of 11

Go to Page Go

Planar Alloy Sputtering Target