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" found 5 Products from Fujian Acetron New Materials CO. , Ltd, China

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Planar Alloy Sputtering Target

Planar Alloy Sputtering Target
material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the ...

Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to the substrate under vacuum conditions, and then the film is processed by various methods ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
material.We have various purity levels to suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the ...
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