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Planar Alloy Sputtering Target: / 99.999% Planar Customized Mo Alloy 99.95% Planar Customized Ni Alloy 99.99% Planar Customized Si Alloy 99.99% Planar / Rotary Customized Alloy sputtering targets play a crucial role in thin film ...

Rotary Ceramic Sputtering Target: enables stable electrical conductivity of oxides with semiconductor characteristics. * Maximum sizes of planar target Thickness: 30mm (can be 60mm for round target) Width: max 2000mm Length: max ...

Planar Ceramic Sputtering Target: enables stable electrical conductivity of oxides with semiconductor characteristics. * Maximum sizes of planar target Thickness: 30mm (can be 60mm for round target) Width: max 2000mm Length: max ...

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Planar Alloy Sputtering Target