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Products > planar target > Fujian Acetron New Materials CO. , Ltd | Similar Products

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planar target

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Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Planar Metal Sputtering Targets: Planar Metal Sputtering Targets Excellent properties such as high purity, high density, high thermal conductivity, high stability, uniform grain, etc. High purity: The metal target requires very high ...

Planar Ceramic Sputtering Target: Planar Ceramic Sputtering Target Excellent properties such as high purity, high density,Good microstructure uniformity, excellent electrical properties. High purity: The metal target requires very ...

Rotary Ceramic Sputtering Target: targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality of materials. High thermal conductivity: the thermal conductivity of ...

Rotary Metal Sputtering Targets: target, we adopt Vacuum melting, Rolling, Low temperature metal,Vacuum hot pressing sintering, Electron beam melting, Zone melting purification, Vacuum directional solidification technology. Both ...

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Planar Alloy Sputtering Target