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Products > process controller > Fujian Acetron New Materials CO. , Ltd | Similar Products

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process controller

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Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target: controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality ...

Rotary Metal Sputtering Targets: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...

Planar Metal Sputtering Targets: Controlled grain size and direction Good composition uniformity: the component distribution is uniform, ensure the film formation rate is uniform, film quality. Manufacturing processes Manufacturing ...

Planar Ceramic Sputtering Target: controlled specific impurities within the target. High density: Metal targets have high density characteristics, usually up to 95-99.5%,（ITO,NbOx can reach 99.5%) to ensure the stability and quality ...

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Planar Alloy Sputtering Target