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Rotary Ceramic Sputtering Target: refers to the technology that the ions produced by the ion source are accelerated to gather in the vacuum to form a high speed ion beam, which bombards the solid surface, and the kinetic energy ...

Rotary Metal Sputtering Targets: refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to ...

Planar Metal Sputtering Targets: refer to circular targets and rectangular targets with certain thickness. The plane target material is connected with sputtering equipment by means of thread, the sputtering film layer is attached to ...

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Rotary Ceramic Sputtering Target