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" found 4 Products from Fujian Acetron New Materials CO. , Ltd, China

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Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
semiconductor, electronics, optics, and surface coating. It is a method of transforming a solid material into a liquid or gaseous state and accelerating it to the target surface using physical vapor ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
coating speed. Microstructure uniformity: powder metallurgy process to ensure the overall uniformity of the target. Excellent electrical properties: Reliable atmosphere sintering enables stable ...
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