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" found 4 Products from Fujian Acetron New Materials CO. , Ltd, China

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Rotary Ceramic Sputtering Target

Rotary Ceramic Sputtering Target
materials. High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed. Microstructure uniformity: powder ...

Rotary Metal Sputtering Targets

Rotary Metal Sputtering Targets
x Length300~3000mm, Thickness: 3~7mm Backing tubes: ID100 x OD108 x Length300~3000mm, Thickness: 3~8mm Backing tubes: ID125 x OD133 x Length300~4000mm, Thickness: 3~13mm Bonding Backing tubes: ID125 ...

Planar Metal Sputtering Targets

Planar Metal Sputtering Targets
materials extensively utilized in modern industry. They are primarily employed in the sputtering process for thin film deposition across various industries, including semiconductor, electronics, ...

Planar Ceramic Sputtering Target

Planar Ceramic Sputtering Target
materials. High thermal conductivity: the thermal conductivity of the metal target is particularly high, which can be cooled quickly and improve the coating speed. Microstructure uniformity: powder ...
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