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Products > suit processing > Fujian Acetron New Materials CO. , Ltd | Similar Products

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Planar Alloy Sputtering Target: Planar Alloy Sputtering Target Excellent properties such as high purity, high density, Good composition uniformity, Uniform grain, etc. High purity: The metal target requires very high purity, to ...

Rotary Ceramic Sputtering Target: suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target. High density: Metal targets have high ...

Rotary Metal Sputtering Targets: suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target High density: Metal targets have high ...

Planar Metal Sputtering Targets: suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target High density: Metal targets have high ...

Planar Ceramic Sputtering Target: suit your specific requirements, with the minimum purity of 99.5% up to 99.9999% for some metals. Also have controlled specific impurities within the target. High density: Metal targets have high ...

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Planar Alloy Sputtering Target